1.

Conference Proceedings
Conference Proceedings
1. X-RAY DIFFRACTION AND REFLECTANCE, RAMAN SCATTERING AND PHOTOLUMINESCENCE CHARACTERIZATION OF THERMALLY ANNEALED EPITAXIAL Si1-XGeX LAYERS
Libezny, M. ; De WoIf, I. ; Poortmans, J. ; Van Ammel, A. ; Caymax, M. ; Holy, V. ; Vi-da, F. ; Kub-na, J. ; Werner, K. ; Ishida, M.
Pub. info.: Silicon-based optoelectronic materials : Symposium held April 12-14, 1993, San Francisco, California, U.S.A..  pp.51-56,  1993.  Pittsburgh, PA.  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 298
2.

Conference Proceedings
Conference Proceedings
2. EVALUATION OF Si SURFACE CONDITIONS BY THE USE OF A SURFACE PHOTOVOLTAGE TECHNIQUE
Trauwaert, M.-A. ; Kenis, K. ; Caymax, M. ; Mertens, P.W. ; Heyns, M.M. ; Vanhellemont, J. ; Graf, D. ; Wagner, P.
Pub. info.: Proceedings of the Fifth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.455-462,  1997.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 97-35
3.

Conference Proceedings
Conference Proceedings
3. Analysis of Junctions Formed in Strained Si/SiGe Substrates
Eneman, G. ; Simoen, E. ; Lauwers, A. ; Lindsay, R. ; Verheyen, P. ; Delhougne, R. ; Loo, R. ; Caymax, M. ; Meunier-Beillard, P. ; Demuynck, S. ; Meyer, K.De ; Vandervorst, W.
Pub. info.: High-mobility group-IV materials and devices : symposium held April 13-15, 2004, San Francisco, California, U.S.A..  pp.187-192,  2004.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 809
4.

Conference Proceedings
Conference Proceedings
4. 34 Improving CMOS performance by AVD〓 grown high-k dielectrics and advanced metal electrodes
Weber, U. ; Boissiere, O. ; Lindner, J. ; Schumacher, M. ; Lehnen, P. ; Manke, C. ; Van Elshocht, S. ; Caymax, M. ; Cosnier, V. ; McEntee, T.
Pub. info.: Advanced gate stack, source/drain and channel engineering for Si-based CMOS, new materials, processes, and equipment : proceedings of the international symposium.  pp.293-300,  2005.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2005-05
5.

Conference Proceedings
Conference Proceedings
5. 16 Properties of HfTaxOy High-K Layers Deposited by ALCVD
Zhao, C. ; Rittersma, Z. M. ; Van Berkum, J. G. M. ; Snijders, J. H. M. ; Hendriks, A. ; Breimer, P. ; Groat, P. ; Maes, J. W. ; Wittesr, H. ; Afanas'ev, V. V. ; Tois, E. ; Tuominen, M. ; Caymax, M. ; De Gendt, S. ; Heyns, M.
Pub. info.: Advanced gate stack, source/drain and channel engineering for Si-based CMOS, new materials, processes, and equipment : proceedings of the international symposium.  pp.133-140,  2005.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2005-05
6.

Conference Proceedings
Conference Proceedings
6. DEGRADATION AND RECOVERY OF BORON DOPED STRAINED SILICON GERMANIUM LAYERS AFTER 1-MeV ELECTRON IRRADIATION
Ohyama, H. ; Vanhellemont, J. ; Trauwaert, M.-A. ; Poortmans, J. ; Caymax, M. ; Clauws, P.
Pub. info.: Semiconductor heterostructures for photonic and electronic applications : symposium held November 30-December 4, 1992, Boston, Massachusetts, U.S.A..  pp.433-438,  1993.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 281
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Conference Proceedings
Conference Proceedings
7. STUDY OF THE TRANSVERSAL ELECTRON MOBILITY IN HETEROJUNCTION BIPOLAR TRANSISTORS WITH STRAINED Si1-XGeX -BASE
Poortmans, J. ; Caymax, M. ; Van Ammel, A. ; Libezny, M. ; Nijs, J.
Pub. info.: Semiconductor heterostructures for photonic and electronic applications : symposium held November 30-December 4, 1992, Boston, Massachusetts, U.S.A..  pp.409-414,  1993.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 281
8.

Conference Proceedings
Conference Proceedings
8. INTEGRATION ISSUES OF POLYSILICON WITH HIGH K DIELECTRICS DEPOSITED BY ATOMIC LAYER CHEMICAL VAPOR DEPOSITION
Tsai, W. ; Chen, I. ; Carter, R. ; Cartier, E. ; Kluth, J. ; Richard, O. ; Claes, M. ; Lin, Y.M. ; Nohira, H. ; Conard, T. ; Caymax, M. ; Young, E. ; Vandervorst, W. ; DeGendt, S. ; Heyns, M. ; Manabe, Y. ; Maes, J.W. ; Rittersma, Z.M. ; Besling, W. ; Roozeboom, F.
Pub. info.: Semiconductor silicon 2002 : proceedings of the ninth International Symposium on Silicon Materials Science and Technology.  pp.747-760,  2002.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2002-2
9.

Conference Proceedings
Conference Proceedings
9. INTEGRATION OF HIGH-k GATE DIELECTRICS - WET ETCH CLEANING AND SURFACE CONDITIONING
De Gendt, S. ; Beckx, S. ; Caymax, M. ; Claes, M. ; Conard, T. ; Delabie, A. ; Deweerd, W. ; Hellin, D. ; Kraus, H. ; Onsia, B. ; Parishev, V. ; Puurunen, R. ; Rohr, E. ; Snow, J. ; Tsai, W. ; Van Doome, P. ; Van Elshocht, S. ; Vertommen, J. ; Witters, T. ; Heyns, M.
Pub. info.: Cleaning technology in semiconductor device manufacturing VIII : proceedings of the international symposium.  pp.67-77,  2003.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-26
10.

Conference Proceedings
Conference Proceedings
10. Compatibility of Polysilicon with HfO2-based Gate Dielectrics for CMOS Applications
Kaushik, V. ; De Gendt, S. ; Caymax, M. ; Young, E. ; Rohr, E. ; Van Elshocht, S. ; Delabie, A. ; Claes, M. ; Shi, X. ; Chen, I. ; Carter, R. ; Conard, T. ; Vandervorst, W. ; Schaekers, M. ; Heyns, M.
Pub. info.: ULSI Process Integration : proceedings of the International Symposium.  pp.391-396,  2003.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-6
11.

Conference Proceedings
Conference Proceedings
11. Degradation and Recovery of Si1-xGex Devices by Irradiation
Ohyama, H. ; Vanhellemont, J. ; Takami, Y. ; Hayama, K. ; Kudo, T. ; Hakata, T. ; Kobayashi, K. ; Sunaga, H. ; Hironaka, I. ; Poortmans, J. ; Caymax, M.
Pub. info.: Strained layer epitaxy - materials processing and device applications : symposium held April 17-19, 1995, San Francisco, California, U.S.A..  pp.365-,  1995.  Pittsburgh, PA.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 379
12.

Conference Proceedings
Conference Proceedings
12. Impact of the Ge Content on the Radiation Hardness of Heterojunction Diodes in SiGe Strained Layers
Ohyama, H. ; Simoen, E. ; Claeys, C. ; Takami, Y. ; Hayama, K. ; Hakata, T. ; Tokuyama, J. ; Kobayashi, K. ; Sunaga, H. ; Poortmans, J. ; Caymax, M.
Pub. info.: Epitaxy and applications of si-based heterostructures : symposium held April 13-17, 1998, San Francisco, California, U.S.A..  pp.99-,  1998.  Warrendale, Pa..  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 533
13.

Conference Proceedings
Conference Proceedings
13. SiGe Thin-Film Structures for Solar Cells
Bremond, G. ; Daami, A. ; Laugier, A. ; Seifert, W. ; Kittler, M. ; Poortmans, J. ; Caymax, M. ; Said, K. ; Konuma, M. ; Gutjahr, A. ; Silier, I.
Pub. info.: Thin-film structures for photovoltaics : symposium held December 2-5, 1997, Boston, Massachusetts, U.S.A..  pp.43-,  1998.  Warrendale, Pa..  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 485
14.

Conference Proceedings
Conference Proceedings
14. Tailored Si Layers on Silicon Oxide Obtained by Thermal CVD
Beaucarne, G. ; Poortmans, J. ; Caymax, M. ; Nijs, J. ; Mertens, R.
Pub. info.: Thin-film structures for photovoltaics : symposium held December 2-5, 1997, Boston, Massachusetts, U.S.A..  pp.89-,  1998.  Warrendale, Pa..  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 485
15.

Conference Proceedings
Conference Proceedings
15. Oxide Mediated Epitaxy on Planar and Non-Planar Si
Tung, R. T. ; Howard, D. J. ; Ohmi, S. ; Caymax, M. ; Maex, K.
Pub. info.: Advanced interconnects and contact materials and processes for future integrated circuits : symposium held April 13-16, 1998, San Francisco, California, U.S.A..  pp.427-,  1998.  Warrendale, Pa..  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 514
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Conference Proceedings
Conference Proceedings
16. The Role of Preamorphization and Activation for Ultra Shallow Junction Formation on Strained Si Layers Grown on SiGe Buffer
Pawlak, B.J. ; Vandervorst, W. ; Lindsay, R. ; Wolf, I.De ; Roozeboom, F. ; Delhougne, R. ; Benedetti, A. ; Loo, R. ; Caymax, M. ; Maex, K. ; Cowern, N.E.B.
Pub. info.: High-mobility group-IV materials and devices : symposium held April 13-15, 2004, San Francisco, California, U.S.A..  pp.281-286,  2004.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 809
17.

Conference Proceedings
Conference Proceedings
17. Physical Characterization of HfO2 Deposited on Ge Substrates by MOCVD
Elshocht, S.Van ; Brijs, B. ; Caymax, M. ; Conard, T. ; Gendt, S.De ; Kubicek, S. ; Meuris, M. ; Onsia, B. ; Richard, O. ; Teerlinck, I. ; Steenbergen, J.Van ; Zhao, C. ; Heyns, M.
Pub. info.: High-mobility group-IV materials and devices : symposium held April 13-15, 2004, San Francisco, California, U.S.A..  pp.287-292,  2004.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 809
18.

Conference Proceedings
Conference Proceedings
18. A Thermal Migration of Ge During Junction Formation in s-Si Layers Grown on Thin SiGe-Buffer Layers
Vandervorst, W. ; Pawlak, B.J. ; Janssens, T. ; Brijs, B. ; Delhougne, R. ; Caymax, M. ; Loo, R.
Pub. info.: High-mobility group-IV materials and devices : symposium held April 13-15, 2004, San Francisco, California, U.S.A..  pp.273-280,  2004.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 809
19.

Conference Proceedings
Conference Proceedings
19. The Role of Preamorphization and Activation for Ultra-Shallow Junction Formation on Strained Si Layers Grown on SiGe Buffer
Pawlak, B.J. ; Vandervorst, W. ; Lindsay, R. ; Wolf, I.De ; Roozeboom, F. ; Delhougne, R. ; Benedetti, A. ; Loo, R. ; Caymax, M. ; Maex, K. ; Cowern, N.E.B.
Pub. info.: Silicon front-end junction formation : physics and technology : symposium held April 13-15, 2004, San Francisco, California, U.S.A..  pp.423-430,  2004.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 810
20.

Conference Proceedings
Conference Proceedings
20. A Thermal Migration of Ge During Junction Formation in s-Si Layers Grown on Thin SiGe-Buffer Layers
Vandervorst, W. ; Pawlak, B.J. ; Janssens, T. ; Brijs, B. ; Delhougne, R. ; Caymax, M. ; Loo, R.
Pub. info.: Silicon front-end junction formation : physics and technology : symposium held April 13-15, 2004, San Francisco, California, U.S.A..  pp.415-422,  2004.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 810
21.

Conference Proceedings
Conference Proceedings
21. The Influence of Defects on Compatibility and Yield of the HfO2-PolySilicon Gate Stack for CMOS Integration
Kaushik, V. S. ; DeGendt, S. ; Carter, R. ; Claes, M. ; Rohr, E. ; Pantisano, L. ; Kluth, J. ; Kerber, A. ; Cosnier, V. ; Cartier, E. ; Tsai, W. ; Young, E. ; Green, M. ; Chen, J. ; Jang, S-A. ; Lin, S. ; Delabie, A. ; Elshocht, S. V. ; Manabe, Y. ; Richard, O. ; Zhao, C. ; Bender, H. ; Caymax, M. ; Heyns, M.
Pub. info.: Crystalline oxide-silicon heterostructures and oxide optoelectronics : symposium held December 2-4, 2002, Boston, Massachusetts, U.S.A..  pp.145-152,  2003.  Warrendale, PA.  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 747
22.

Conference Proceedings
Conference Proceedings
22. Application of X-Ray Fluorescence Spectrometry in Characterization of High-k Ultra-Thin Films
Zhao, C. ; Brijs, B. ; Dortu, F. ; DeGendt, S. ; Caymax, M. ; Heyns, M. ; Besling, W. ; Maes, J.W.
Pub. info.: Analytical and diagnostic techniques for semiconductor materials, devices, and processes : joint proceedings of the symposia on: ALTECH 2003, Analytical Techniques for Semiconductor Materials and Process Characterization IV, Paris, France and the 202nd Meeting of the Electrochemical Society, Diagnostic Techniques for Semiconductor Materials and Devices VI, Salt Lake City, Utah.  pp.243-251,  2003.  Pennington, NJ.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5133
23.

Conference Proceedings
Conference Proceedings
23. Characterization of Nano-Laminate Structure Using Grazing Incidence XRD and ATR-FTIR
Zhao, C. ; DeGendt, S. ; Caymax, M. ; Heyns, M. ; Consier, V. ; Maes, J.W. ; Roebben, G. ; Van Der Biest, O.
Pub. info.: Analytical and diagnostic techniques for semiconductor materials, devices, and processes : joint proceedings of the symposia on: ALTECH 2003, Analytical Techniques for Semiconductor Materials and Process Characterization IV, Paris, France and the 202nd Meeting of the Electrochemical Society, Diagnostic Techniques for Semiconductor Materials and Devices VI, Salt Lake City, Utah.  pp.252-259,  2003.  Pennington, NJ.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5133
24.

Conference Proceedings
Conference Proceedings
24. Characterization of Advanced Semiconductor Materials by Thermal Desorption Mass Spectrometry with Atmospheric, Pressure Ionization
Carbonell, L. ; Vereecke, G. ; Van Elshocht, S. ; Caymax, M. ; Van Hove, M. ; Maex, K. ; Mertens, P.
Pub. info.: Analytical and diagnostic techniques for semiconductor materials, devices, and processes : joint proceedings of the symposia on: ALTECH 2003, Analytical Techniques for Semiconductor Materials and Process Characterization IV, Paris, France and the 202nd Meeting of the Electrochemical Society, Diagnostic Techniques for Semiconductor Materials and Devices VI, Salt Lake City, Utah.  pp.150-159,  2003.  Pennington, NJ.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5133
25.

Conference Proceedings
Conference Proceedings
25. The Influence of Defects on Compatibility and Yield of the HfO2-PolySilicon Gate Stack for CMOS Integration
Kaushik, V.S. ; Gendt, S.De ; Carter, R. ; Claes, M. ; Rohr, E. ; Pantisano, L. ; Kluth, J. ; Kerber, A. ; Cosnier, V. ; Cartier, E. ; Tsai, W. ; Young, E. ; Green, M. ; Chen, J. ; Jang, S-A. ; Lin, S. ; Delabie, A. ; Elshocht, S.V. ; Manabe, Y. ; Richard, O. ; Zhao, C. ; Bender, H. ; Caymax, M. ; Heyns, M.
Pub. info.: Novel materials and processes for advances CMOS : symposium held December 2-4, 2002, Boston, Massachusetts, U.S.A..  pp.335-342,  2003.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 745
26.

Conference Proceedings
Conference Proceedings
26. 13 High-k Gate Stack Engineering - towards Meeting Low Standby Power and High Performance Targets
De Gendt, S. ; Brunco, D. ; Caymax, M. ; Canard, T. ; Date, L. ; Delabie, A. ; Deweerd, W. ; Groeseneken, G. ; Houssa, M. ; Hyun, S. ; Kaushik, V. ; Kubicek, S. ; Maes, J. ; Pantisano, L. ; Ragnarsson, L. ; Rohr, E. ; Schram, T. ; Shimamoto, Y. ; Sleeckx, E. ; Vandervorst, W. ; Van Elshocht, S. ; Yamamoto, K. ; Witters, T. ; Zhao, C. ; Zimmerman, P. ; Heyns, M. (Invited Paper)
Pub. info.: Advanced gate stack, source/drain and channel engineering for Si-based CMOS, new materials, processes, and equipment : proceedings of the international symposium.  pp.109-117,  2005.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2005-05
27.

Conference Proceedings
Conference Proceedings
27. P+/N Junction Formation in Thin Strain Relaxed Buffer Strained Silicon Substrates: The Effect of the Junction Anneal
Eneman, G. ; Simoen, E. ; Delhougne, R. ; Verheyen, P. ; Simons, V. ; Loo, R. ; Caymax, M. ; De Meyer, K. ; Vandervorst, W. ; Claeys, C.
Pub. info.: ULSI Process Integration : proceedings of the International Symposium.  pp.338-348,  2005.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2005-06
28.

Conference Proceedings
Conference Proceedings
28. ION IMPLANTATION OF HIGH DOSES OF Co IN Si1-xGex ALLOYS
Lauwers, A. ; Maex, K. ; Vandervorst, W. ; Brijs, G. ; Poortmans, J. ; Caymax, M. ; Vanhellemont, J. ; Petersson, S.
Pub. info.: Phase formation and modification by beam-solid interactions : symposium held December 2-6, 1991, Boston, Massachusetts, U.S.A..  pp.299-304,  1992.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 235
29.

Conference Proceedings
Conference Proceedings
29. (12.4) 7:45 - 8:05 PM - Selective Epitaxy of Si and SiGe for Advanced Applications: Possibilities and Limitations
Caymax, M. ; Loo, R. (IMEC)
Pub. info.: SiGe: materials, processing, and devices : proceedings of the First international symposium.  pp.815-824,  2004.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2004-07
30.

Conference Proceedings
Conference Proceedings
30. (11.1) 3:10 - 3:40 PM - Strained Silicon on Relaxed SiGe Made by Ion Implantation and Strain Transfer (Invited)
Mantl, S. ; Buca, D. M. ; Hollander, B. ; Morschbacher, M. ; Trinkaus, H. ; Luysberg, M. ; Hueging, N. ; Carius, L. Houben'R. ; Loo, R. ; Caymax, M. ; Schafer, H. (ISG1-IT)
Pub. info.: SiGe: materials, processing, and devices : proceedings of the First international symposium.  pp.731-740,  2004.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2004-07
31.

Conference Proceedings
Conference Proceedings
31. (19.2) 1:30 - 1:50 PM - Maximization of Active As Doping in (selective) Epitaxial Si and SiGe Layers
Loo, R. ; Bajolet, P. ; Maes, J.W. ; Bauer, M. ; Caymax, M. ; Arena, C. (MEC)
Pub. info.: SiGe: materials, processing, and devices : proceedings of the First international symposium.  pp.1123-1134,  2004.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2004-07
32.

Conference Proceedings
Conference Proceedings
32. Physcial Characterization of Ultrathin High-k Dielectrics
Vandervorst, W. ; Brijs, B. ; Bender, H. ; Conard, O.T. ; Petry, J. ; Richard, O. ; Elshocht, S.Van ; Delabie, A. ; Caymax, M. ; Gendt, S.De
Pub. info.: Novel materials and processes for advances CMOS : symposium held December 2-4, 2002, Boston, Massachusetts, U.S.A..  pp.23-34,  2003.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 745
33.

Conference Proceedings
Conference Proceedings
33. Thermal Stability of High-k Layers
Zhao, C. ; Cosnier, V. ; Chen, P.J. ; Richard, O. ; Roebben, G. ; Maes, J. ; Elshocht, S.Van ; Bender, H. ; Young, E. ; Biest, O.Van Der ; Caymax, M. ; Vandervorst, W. ; Gendt, S.De ; Heyns, M.
Pub. info.: Novel materials and processes for advances CMOS : symposium held December 2-4, 2002, Boston, Massachusetts, U.S.A..  pp.9-14,  2003.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 745
34.

Conference Proceedings
Conference Proceedings
34. Effect of Al-Content and Post Deposition Annealing on the Electrical Properties of Ultra-Thin HfAlxOy Layers
Carter, R.J. ; Tsai, W. ; Young, E. ; Caymax, M. ; Maes, J.W. ; Chen, P.J. ; Delabie, A. ; Zhao, C. ; Gendt, S.De ; Heyns, M.
Pub. info.: Novel materials and processes for advances CMOS : symposium held December 2-4, 2002, Boston, Massachusetts, U.S.A..  pp.35-40,  2003.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 745
35.

Conference Proceedings
Conference Proceedings
35. Growth and Physical Properties of MOCVD-Deposited Hafnium Oxide Films and Their Properties on Silicon
Elshocht, S.Van ; Caymax, M. ; Gendt, S.De ; Conard, T. ; Petry, J. ; Claes, M. ; Witters, T. ; Zhao, C. ; Brijs, B. ; Richard, O. ; Bender, H. ; Vandervorst, W. ; Carter, R. ; Kluth, J. ; Date, L. ; Pique, D. ; Heyns, M.M.
Pub. info.: Novel materials and processes for advances CMOS : symposium held December 2-4, 2002, Boston, Massachusetts, U.S.A..  pp.197-202,  2003.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 745
36.

Conference Proceedings
Conference Proceedings
36. Characterization of Advanced Semiconductor Materials by Thermal Desorption Mass Spectrometry with Atmospheric, Pressure Ionization
Carbonell, L. ; Vereecke, G. ; Van Elshocht, S. ; Caymax, M. ; Van Hove, M. ; Maex, K. ; Mertens, P.
Pub. info.: Analytical and diagnostic techniques for semiconductor materials, devices, and processes : joint proceedings of the symposia on: ALTECH 2003, Analytical Techniques for Semiconductor Materials and Process Characterization IV, Paris, France and the 202nd Meeting of the Electrochemical Society, Diagnostic Techniques for Semiconductor Materials and Devices VI, Salt Lake City, Utah.  pp.150-159,  2003.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-3
37.

Conference Proceedings
Conference Proceedings
37. N+/P and P+/N Junctions in Strained Si on Thin Strain Relaxed SiGe Buffers: the Effect of Defect Density and Layer Structure
Eneman, G. ; Simoen, E. ; Delhougne, R. ; Verheyen, P. ; Ries, M. ; Loo, R. ; Caymax, M. ; Vandervorst, W. ; De Meyer, K.
Pub. info.: Semiconductor defect engineering - materials, synthetic structures and devices : symposium held March 28-April 1, 2005, San Francisco, California, U.S.A..  pp.119-124,  2005.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 864
38.

Conference Proceedings
Conference Proceedings
38. INTEGRATION ISSUES OF POLYSILICON WITH HIGH K DIELECTRICS DEPOSITED BY ATOMIC LAYER CHEMICAL VAPOR DEPOSITION
Tsai, W. ; Chen, I. ; Carter, R. ; Cartier, E. ; Kluth, J. ; Richard, O. ; Claes, M. ; Lin, Y.M. ; Nohira, H. ; Conard, T. ; Caymax, M. ; Young, E. ; Vandervorst, W. ; DeGendt, S. ; Heyns, M. ; Manabe, Y. ; Maes, J.W. ; Rittersma, Z.M. ; Besling, W. ; Roozeboom, F.
Pub. info.: Semiconductor silicon 2002 : proceedings of the ninth International Symposium on Silicon Materials Science and Technology.  pp.747-760,  2002.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2002-2
39.

Conference Proceedings
Conference Proceedings
39. Scalability of MOCVD-Deposited Hafnium Oxide
Elshocht, S. Van ; Carter, R. ; Caymax, M. ; Claes, M. ; Conard, T. ; Date, L. ; Gendt, S. De ; Kaushik, V. ; Kerber, A. ; Kluth, J. ; Lujan, G. ; Petry, J. ; Pique, D. ; Richard, O. ; Rohr, E. ; Shimamoto, Y. ; Tsai, W. ; Heyns, M. M.
Pub. info.: CMOS front-end materials and process technology : symposium held April 22-24, 2003, San Francisco, California, U.S.A..  pp.59-64,  2003.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 765
40.

Conference Proceedings
Conference Proceedings
40. Physical Characterization of HfO2 Deposited on Ge Substrates by MOCVD
Elshocht, S.Van ; Brijs, B. ; Caymax, M. ; Conard, T. ; Gendt, S.De ; Kubicek, S. ; Meuris, M. ; Onsia, B. ; Richard, O. ; Teerlinck, I. ; Steenbergen, J.Van ; Zhao, C. ; Heyns, M.
Pub. info.: Integration of advanced micro- and nanoelectronic devices - critical issues and solutions : symposium held April 13-16, 2004, San Francisco, California, U.S.A..  pp.163-168,  2004.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 811
41.

Conference Proceedings
Conference Proceedings
41. (Selective) Epitaxial Growth of Strained Si to Fabricate Low Cost and High Performance CMOS Devices
Loo, R. ; Delhougne, R. ; Meunier-Beillard, P. ; Caymax, M. ; Verheyen, P. ; Eneman, G. ; Wolf, I.De ; Janssens, T. ; Benedetti, A. ; Meyer, K.De ; Vandervorst, W. ; Heyns, M.
Pub. info.: High-mobility group-IV materials and devices : symposium held April 13-15, 2004, San Francisco, California, U.S.A..  pp.3-14,  2004.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 809
42.

Conference Proceedings
Conference Proceedings
42. ALD HfO2 Surface Preparation Study
Delabie, Annelies ; Caymax, M. ; Maes, J.W. ; Bajolet, P. ; Brijs, B. ; Cartier, E. ; Conard, T. ; Gendt, S.De ; Richard, O. ; Vandervorst, W. ; Zhao, C. ; Green, M. ; Tsai, W. ; Heyns, M.M.
Pub. info.: Novel materials and processes for advances CMOS : symposium held December 2-4, 2002, Boston, Massachusetts, U.S.A..  pp.179-184,  2003.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 745
43.

Conference Proceedings
Conference Proceedings
43. The Use of Ion Implantation and Annealing for the Fabrication of Strained Silicon on Thin SiGe Virtual Substrates
Buca, D. ; Morschbacher, M.J. ; Hollander, B. ; Luysberg, M. ; Loo, R. ; Caymax, M. ; Mantl, S.
Pub. info.: High-mobility group-IV materials and devices : symposium held April 13-15, 2004, San Francisco, California, U.S.A..  pp.15-26,  2004.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 809
44.

Conference Proceedings
Conference Proceedings
44. Effect Of Deposition Conditions On The Structural And Mechanical Properties Of Poly SiGe
Caymax, M. ; Saerens, A. ; Sedky, S. ; VanHoutte, P. ; Witvrouw, A.
Pub. info.: Amorphous and heterogeneous silicon thin films - 2000 : symposium held April 24-28, 2000, San Francisco, California, U.S.A..  pp.A8.5-,  2001.  Warrendale.  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 609
45.

Conference Proceedings
Conference Proceedings
45. Preparation and Residual Stress Characterization of Polycrystalline Silicon Germanium Films Grown by Atmospheric Pressure Chemical Vapor Deposition
Fiorini, P. ; Sedky, S. ; Caymax, M. ; Baert, C.
Pub. info.: Polycrystalline thin films : structure, texture, properties and applications III : symposium held March 31-April 3, 1997, San Francisco, California, U.S.A..  pp.227-,  1997.  Pittsburgh, Pa..  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 472
46.

Conference Proceedings
Conference Proceedings
46. Nanometer-scale roughness analysis of Si surfaces by TM-AFM for low-temperature epitaxy
Chollet, F. ; Caymax, M. ; Vandervorst, W. ; Andre, E.
Pub. info.: ALTECH 95 : analytical techniques for semiconductor materials and process characterization II : proceedings of the Satellite Symposium to ESSDERC 95, The Hague, The Netherlands.  pp.263-270,  1995.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 95-30