Callegari, A. ; Jamison, P. ; Zafar, S. ; Lacey, D. ; McFeefy, F. ; Shepard, J. ; Gusev, E.P. ; Cartier, E. ; Jammy, R.
Pub. info.:
Advanced gate stack, source/drain and channel engineering for Si-based CMOS, new materials, processes, and equipment : proceedings of the international symposium. pp.319-323, 2005. Pennington, NJ. Electrochemical Society
Okorn-Schmidt, H.F. ; Gusev, E.P. ; Buchanan, D.A. ; Cartier, E. ; Guha, S. ; Bojarczuk, N.A. ; Rath, D.L. ; Callegari, A. ; Gribelyuk, M. ; Copel, M.
Pub. info.:
The physics and chemistry of SiO2 and the Si-SiO2 interface-4, 2000 : proceedings of the fourth International Symposium on the Physics and Chemistry of SiO2 and the Si-SiO2 Interface, Tronto, Canada, May 15-18, 2000. pp.505-512, 2000. Pennington, N.J.. Electrochemical Society