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12 results

Conference Proceedings

1. Elfect of Deposition Sequence and Plasma Treatment on ALCVD HfO₂ n-MOSFET Properties

C. Lim ; Y. Kim ; A. Hou ; J. Gutt ; S. Marcus ; C. Pomarede ; E. Shero ; H. de Waard ; C. Werkhoven ; L. Chen ; J. Tamim ; N. Chaudhary ; G. Bersuker ; J. Barnett ; C. Young ; P. Zeitzoff ; G. A. Brown ; M. Gardner ; R. W. Murto ; H. R. Huff

Pub. info.:	Physicas and technology of high-k gate dielectrics : proceedings of the International Symposium on High Dielectric Constant Materials : Materials Science, Processing, and Reliability, and Manufacturing Issues. pp.83-92, 2002. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2002-28

Conference Proceedings

2. Improved Scalability of High-K Gate Dielectrics by using Hf-Aluminates

T. H. Hou ; J. Gutt ; C. Lim ; S. Marcus ; C. Pomarede ; E. Shera ; H. de Warrd ; C. Werkhoven ; M. Gardner ; R. W. Murto ; H. R. Huff

Pub. info.:	Physicas and technology of high-k gate dielectrics : proceedings of the International Symposium on High Dielectric Constant Materials : Materials Science, Processing, and Reliability, and Manufacturing Issues. pp.141-148, 2002. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2002-28

Conference Proceedings

3. Neutron techniques of on-line analysis in the Australian mineral industry

C. Lim ; B. Sowerby

Pub. info.:	International Conference : neutrons and their applications : 12-18 June 1994, Crete, Greece. pp.419-423, 1995. Bellingham, WA. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2339

Conference Proceedings

4. Improvement of front-end process overlay in 60nm DRAM

Y. Hwang ; W. Ma ; E. Kang ; C. Lim ; S. Moon ; S. An ; K. Rhe

Pub. info.:	Metrology, inspection, and process control for microlithography XXI. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6518

Conference Proceedings

5. Hardware, materials, and parameters optimization for improvement of immersion overlay

W. Ma ; Y. Hwang ; E. Kang ; S. Park ; J. Kang ; C. Lim ; S. Moon

Pub. info.:	Metrology, inspection, and process control for microlithography XXI. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6518

Conference Proceedings

6. Characteristics and prevention of pattern collapse in EUV lithography

W. Chang ; E. Kim ; Y. Kang ; S. Park ; C. Lim ; K. Won ; J. Kim ; H. Oh

Pub. info.:	Emerging lithographic technologies XI. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6517

Conference Proceedings

7. Issues and challenges of double patterning lithography in DRAM

S. Kim ; S. Koo ; J. Choi ; Y. Hwang ; J. Park ; E. Kang ; C. Lim ; S. Moon ; J. Kim

Pub. info.:	Optical microlithography XX. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6520

Conference Proceedings

8. Hyper NA polarized imaging of 45nm DRAM

C. Lim ; S. Park ; Y. Hyun ; J. Kim ; T. Eom ; J. Park ; S. Moon

Pub. info.:	Optical microlithography XX. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6520

Conference Proceedings

9. Experimental demonstration of impact of amplified spontaneous emission on devices based on cross-gain modulation in semiconductor optical amplifiers

B. S. G. Pillai ; K. L. Lee ; A. Nirmalathas ; M. Premaratne ; C. Lim

Pub. info.:	Noise and fluctuations in photonics, quantum optics, and communications : 21-24 May 2007, Florence, Italy. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6603

10.

Conference Proceedings

10. Coupled-dipole modelling for 3D mask simulation

V. Temchenko ; C. Lim ; D. Wallis ; J. Schneider ; M. Niehoff

Pub. info.:	Optical Microlithography XXI. 1 pp.69240W-1-69240W-11, 2008. Bellingham, Wash.. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6924

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