1.

Conference Proceedings
Conference Proceedings
1. Improvement of front-end process overlay in 60nm DRAM
Y. Hwang ; W. Ma ; E. Kang ; C. Lim ; S. Moon ; S. An ; K. Rhe
Pub. info.: Metrology, inspection, and process control for microlithography XXI.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6518
2.

Conference Proceedings
Conference Proceedings
2. Hardware, materials, and parameters optimization for improvement of immersion overlay
W. Ma ; Y. Hwang ; E. Kang ; S. Park ; J. Kang ; C. Lim ; S. Moon
Pub. info.: Metrology, inspection, and process control for microlithography XXI.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6518
3.

Conference Proceedings
Conference Proceedings
3. Alignment system and process optimization for improvement of double patterning overlay
W. Ma ; J. Kang ; C. Lim ; H. Kim ; S. Moon
Pub. info.: Metrology, inspection, and process control for microlithography XXII.  2  pp.69222T-1-69222T-8,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6922