1.

Conference Proceedings
Conference Proceedings
1. Characteristics and prevention of pattern collapse in EUV lithography
W. Chang ; E. Kim ; Y. Kang ; S. Park ; C. Lim ; K. Won ; J. Kim ; H. Oh
Pub. info.: Emerging lithographic technologies XI.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6517
2.

Conference Proceedings
Conference Proceedings
2. Issues and challenges of double patterning lithography in DRAM
S. Kim ; S. Koo ; J. Choi ; Y. Hwang ; J. Park ; E. Kang ; C. Lim ; S. Moon ; J. Kim
Pub. info.: Optical microlithography XX.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6520
3.

Conference Proceedings
Conference Proceedings
3. Hyper NA polarized imaging of 45nm DRAM
C. Lim ; S. Park ; Y. Hyun ; J. Kim ; T. Eom ; J. Park ; S. Moon
Pub. info.: Optical microlithography XX.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6520