1.

Conference Proceedings
Conference Proceedings
1. Advanced method to monitor design-process marginality for 65nm node and beyond
C. Huang ; C. Young ; H. Liu ; S. F. Tzou ; D. Tsui
Pub. info.: Metrology, inspection, and process control for microlithography XXII.  2  pp.69222D-1-69222D-6,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6922
2.

Conference Proceedings
Conference Proceedings
2. Effective learning and feedback to designers through design and wafer inspection integration
C. Huang ; H. Liu ; S. F. Tzou ; A. Park ; C. Young
Pub. info.: Design for manufacturability through design-process integration II : 28-29 February 2008, San Jose, California, USA.  pp.692506-1-692506-8,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6925