1.

Conference Proceedings
Conference Proceedings
1. Evaluation of litho printability of DRAM contact hole patterns with various programmed defects
K. Seo ; S. Lee ; H. Kim ; D. Hwang ; S. Kim ; G. Jeong ; O. Han ; C. Chen ; D. Yee ; E. Kim ; K. Park ; N. Kim ; S. Choi ; D. Kim ; S. Lohokare
Pub. info.: Photomask and next-generation lithography mask technology XIV.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6607
2.

Conference Proceedings
Conference Proceedings
2. EUV mask process development using DUV inspection system
D. Kim ; V. Vellanki ; W. Huang ; A. Cao ; C. Chen
Pub. info.: Photomask technology 2007.  3  pp.67305M-1-67305M-8,  2007.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6730
3.

Conference Proceedings
Conference Proceedings
3. Improving inspectability with KLA-Tencor TeraScan thin line de-sense
C. Chen ; D. Kim ; K. H. Park ; N. Kim ; S. H. Han
Pub. info.: Photomask technology 2007.  3  pp.67303O-1-67303O-6,  2007.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6730