1.

Conference Proceedings
Conference Proceedings
1. Performance data of a variable transmission phase shifting mask blank for 193nm lithography enhanced by inspection contrast tuning [5963-19]
Becker, H. ; Renno, M. ; Hermanns, U. ; Seitz, H. ; Buttgereit, U. ; Knapp, K. ; Hess, G.
Pub. info.: Advances in optical thin films II : 13-15 September 2005, Jena, Germany.  pp.59630J-,  2005.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5963
2.

Conference Proceedings
Conference Proceedings
2. Production challenges of making EUV mask blanks
Seitz, H. ; Sobel, F. ; Renno, M. ; Leutbecher, T. ; Olschewski, N. ; Reichardt, T. ; Walter, R. ; Becker, H. ; Buttgereit, U. ; HeB, G. ; Knapp, K. ; Wies, C. ; Lebert, R.
Pub. info.: EMLC 2005 : 21st European Mask and Lithography Conference : 31 January-3 February, 2005, Dresden, Germany.  pp.244-251,  2005.  Bellingham, Wash.,.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5835
3.

Conference Proceedings
Conference Proceedings
3. Antireflection solutions for next generation 193-nm binary and phase-shifting masks [5992-18]
Becker, H. ; Renno, M. ; Hermanns, U. ; Seitz, H. ; Buttgereit, U. ; Knapp, K. ; Hess, G.
Pub. info.: 25th Annual BACUS Symposium on Photomask Technology.  pp.59920I-,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5992
4.

Conference Proceedings
Conference Proceedings
4. High-performance 6-in. EUV mask blanks produced under real production conditions by ion-beam sputter deposition
Becker, H.W. ; Sobel, F. ; Aschke, L. ; Renno, M. ; Krieger, J. ; Buttgereit, U. ; HeB, G. ; Lenzen, F. ; Knapp, K. ; Yulin, S.A. ; Feigl, T. ; Kuhlmann, T. ; Kaiser, N.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part One  pp.389-399,  2002.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
5.

Conference Proceedings
Conference Proceedings
5. Development of a new PSM film system for 157-nm extensible to high-transmission 193 nm lithography
Becker, H.W. ; Chey, J. ; Sobel, F. ; Schmidt, F. ; Renno, M. ; Buttgereit, U. ; Angelopoulos, M. ; Hess, G. ; Knapp, K.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.204-212,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256
6.

Conference Proceedings
Conference Proceedings
6. Absorber stack optimization toward EUV lithography mask blank pilot production
Sobel, F. ; Aschke, L. ; Renno, M. ; Seitz, H. ; Becker, H. W. ; Olschewski, N. ; Reichardt, T. ; Hess, G. ; Buttgereit, U. ; Knapp, K. ; Letzkus, F. ; Butschke, J. ; Koepernik, C.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.781-790,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567
7.

Conference Proceedings
Conference Proceedings
7. Update on the EUVL mask blank activity at Schott Lithotec
Sobel, F. ; Aschke, L. ; Becker, H.W. ; Renno, M. ; Ruggeberg, F. ; Kirchner, S. ; Leutbecher, T. ; Olschewski, N. ; Schiffler, M. ; Walter, K. ; Hess, G. ; Buttgereit, U. ; Knapp, K. ; Lebert, R. ; Juschkin, L. ; Wies, C. ; Jagle, B.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.1259-1270,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256
8.

Conference Proceedings
Conference Proceedings
8. Performance data on new tunable attenuating PSM for 193-nm and 157-nm lithography
Becker, H.W. ; Schmidt, F. ; Sobel, F. ; Renno, M. ; Buttgereit, U. ; Chey, J. ; Angelopoulos, M. ; Knapp, K. ; Hess, G.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.542-549,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446
9.

Conference Proceedings
Conference Proceedings
9. New solutions for inspection contrast tuning, enhanced chemical durability, and a new ultrahigh-transmission PSM
Becker, H. W. ; Schley, P. ; Schmidt, F. ; Sobel, F. ; Renno, M. ; Olschewski, N. ; Seitz, H. ; Buttgereit, U. ; Knapp, K. ; Hess, G.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.659-668,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567