Becker, H. ; Renno, M. ; Hermanns, U. ; Seitz, H. ; Buttgereit, U. ; Knapp, K. ; Hess, G.
Pub. info.:
Advances in optical thin films II : 13-15 September 2005, Jena, Germany. pp.59630J-, 2005. Bellingham, Wash., USA. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Seitz, H. ; Sobel, F. ; Renno, M. ; Leutbecher, T. ; Olschewski, N. ; Reichardt, T. ; Walter, R. ; Becker, H. ; Buttgereit, U. ; HeB, G. ; Knapp, K. ; Wies, C. ; Lebert, R.
Pub. info.:
EMLC 2005 : 21st European Mask and Lithography Conference : 31 January-3 February, 2005, Dresden, Germany. pp.244-251, 2005. Bellingham, Wash.,. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Yoshizawa, M. ; Philipsen, V. ; Leunissen, A. H. L. ; Hendrickx, E. ; Jonckheere, R. ; Vandenberghe, G. ; Buttgereit, U. ; Becker, H. ; Koepernik, C. ; Irmscher, M.
Pub. info.:
Photomask and Next-Generation Lithography Mask Technology XIII. pp.62831G-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Koepernik, C. ; Becker, H. ; Brikner, R. ; Buttgereit, U. ; Irmscher, M. ; Nedelmann, L. ; Zibold, A.
Pub. info.:
Photomask and Next-Generation Lithography Mask Technology XIII. pp.62831D-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering