1.

Conference Proceedings
Conference Proceedings
1. VUV spectrophotometry for photomasks characterization at 193 nm [5965-59]
Yang, M. ; Leiterer, J. ; Gatto, A. ; Kaiser, N. ; Hollein, I. ; Teuber, S. ; Bubke, K.
Pub. info.: Optical fabrication, testing and metrology II : 13-15 September 2005, Jena, Germany.  pp.59651L-,  2005.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5965
2.

Conference Proceedings
Conference Proceedings
2. Study of stress birefringence for 1 93-nm immersion photomasks [5853-02]
Cotte, E. ; Selle, M. ; Bubke, K. ; Teuber, S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.10-19,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853
3.

Conference Proceedings
Conference Proceedings
3. Determination of mask induced polarization effects on AltPSM mask structures [5853-106]
Hollein, I. ; Teuber, S. ; Bubke, K.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.194-201,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853