1.

Conference Proceedings
Conference Proceedings
1. Alternating PSM balancing characterization: a comparative study using AIMS and wafer print data [6154-163]
Sczyrba, M. ; Kahle, R. ; Bubke, K. ; Pforr, R. ; Neubauer, R.
Pub. info.: Optical Microlithography XIX.  pp.615448-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6154
2.

Conference Proceedings
Conference Proceedings
2. Simulation of quartz phase etch affect on performance of ArF chrome-less hard shifter for 65-nm technology [5853-57]
Park, K. T. ; Sczyrba, M. ; Bubke, K. ; Pforr, R.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.722-730,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853
3.

Conference Proceedings
Conference Proceedings
3. Image degradation due to phase effects in chromeless phase lithography [6349-38]
Bubke, K. ; Sczyrba, M. ; Park, K. T. ; Neubauer, R. ; Pforr, R. ; Reichelt, J. ; Ziebold, R.
Pub. info.: Photomask Technology 2006.  pp.634913-634914,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6349
4.

Conference Proceedings
Conference Proceedings
4. Aerial image based mask defect detection in dense array structures [5853-85]
Kohle, R. ; Hennig, M. ; Pforr, R. ; Bubke, K. ; Sczyrba, M. ; Durr, A. C.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.953-964,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853