Kohle, R. ; Hennig, M. ; Pforr, R. ; Bubke, K. ; Sczyrba, M. ; Durr, A. C.
Pub. info.:
Photomask and Next-Generation Lithography Mask Technology XII. pp.953-964, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering