1.

Conference Proceedings
Conference Proceedings
1. Pellicle-induced aberrations and apodization in hyper NA optical lithography [6283-115]
Bubke, K. ; Alles, B ; Cotte, E. ; Sczyrba, M. ; Pierrat, C.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XIII.  pp.628318-628318,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6283
2.

Conference Proceedings
Conference Proceedings
2. Study of stress birefringence for 1 93-nm immersion photomasks [5853-02]
Cotte, E. ; Selle, M. ; Bubke, K. ; Teuber, S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.10-19,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853