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14 results

Conference Proceedings

1. Stress in Microwave Plasma Chemical Vapor Deposited (MPCVD) Diamond Films

Naseem, H.A. ; Haque, M.S. ; Beera, R.A. ; Brown, W.D. ; Malshe, A.P.

Pub. info.:	Proceedings of the Thirteenth International Symposium on Chemical Vapor Deposition. pp.685-690, 1996. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	96-5

Conference Proceedings

2. A Highly Adhesive Gold-Based Metallization System for CVD Diamond Substrates

Jahangir, Farhat ; Naseem, H.A. ; Brown, W.D. ; Malshe, A.P. ; Ang, S.S.

Pub. info.:	Diamond materials : proceedings of the sixth international symposium. pp.275-289, 1999. Pennington, N.J.. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	99-32

Conference Proceedings

3. Deposition of Hard Diamond-Like Carbon Films at Room Temperature

Brown, W.D. ; Beera, R.A. ; Naseem, H.A. ; Malshe, A.P.

Pub. info.:	Proceedings of the Thirteenth International Symposium on Chemical Vapor Deposition. pp.670-678, 1996. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	96-5

Conference Proceedings

4. DEPOSITION OF FLUORINATED SILICON NITRIDE USING PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION TECHNIQUE

Khan, I. ; Naseem, H.A. ; Ang, S.S. ; Brown, W.D.

Pub. info.:	Amorphous silicon technology 1991 : symposium held April 30-May 3, 1991, Anaheim, California, U.S.A.. pp.757-762, 1991. Pittsburgh, Pa.. Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	219

Conference Proceedings

5. WIDE BANDGAP FLUORINATED SILICON-CARBIDE-NITRIDE FILMS USING NP3

Goh, H.C. ; Tan, S.M. ; Naseem, H.A. ; Ang, S.S. ; Brown, W.D.

Pub. info.:	Amorphous silicon technology 1991 : symposium held April 30-May 3, 1991, Anaheim, California, U.S.A.. pp.763-768, 1991. Pittsburgh, Pa.. Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	219

Conference Proceedings

6. HYDROGENATED AMORPHOUS SILICON/ALUMINUM INTERACTION AT LOW TEMPERATURES

Haque, M.S. ; Naseem, H.A. ; Brown, W.D. ; Ang, S.S.

Pub. info.:	Amorphous silicon technology, 1992. pp.1037-1044, 1992. Pittsburgh, Pa.. Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	258

Conference Proceedings

7. High Rate Deposition Of Silicon Dioxide Using PECVD For MCM Applications

Haque, M.S. ; Naseem, H.A. ; Brown, W.D. ; Arbuckle, B.W. ; Mhaskar, P.A.

Pub. info.:	Proceedings of the third Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films. pp.208-217, 1994. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	1994-16

Conference Proceedings

8. RECENT OBSERVATIONS OF MICROCAVITIES IN CVD DIAMOND: THEIR EFFECTS ON MCM PROCESSING

Malshe, A.P. ; Glezen, J.G. ; Naseem, H.A. ; Brown, W.D.

Pub. info.:	Proceedings of the Fourth International Symposium on Diamond Materials. pp.515-522, 1995. Pennington, N.J.. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	95-4

Conference Proceedings

9. LARGE AREA DIAMOND FILM DEPOSITION FOR MULTICHIP MODULES (MCMS)

Brown, W.D. ; Beera, R. ; Haque, M.S. ; Naseem, H.A. ; Bootz, D. ; Gordon, M.H. ; Malshe, A.P.

Pub. info.:	Proceedings of the Fourth International Symposium on Diamond Materials. pp.636-642, 1995. Pennington, N.J.. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	95-4

10.

Conference Proceedings

10. RESIDUAL STRESS MEASUREMENT OF HFCVD DIAMOND COATING ON TOOL INSERTS

Taher, M. ; Schultz, J. ; Nasrazadani, S. ; Naseem, H.A. ; Brown, W.D. ; Malshe, A.P.

Pub. info.:	Proceedings of the Fourth International Symposium on Diamond Materials. pp.614-623, 1995. Pennington, N.J.. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	95-4

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