1.

Conference Proceedings
Conference Proceedings
1. CD-SEM measurement line-edge roughness test patterns for 193-nm lithography
Bunday, B.D. ; Bishop, M. ; Villarrubia, J.S. ; Vladar, A.E.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVII.  1  pp.674-688,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5038
2.

Conference Proceedings
Conference Proceedings
2. CD-SEM measurement line edge roughness test patterns for 193 nm lithography
Bunday, B.D. ; Bishop, M. ; Villarrubia, J.S. ; Vladar, A.E.
Pub. info.: Process and Materials Characterization and Diagnostics in IC Manufacturing.  pp.127-141,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5041
3.

Conference Proceedings
Conference Proceedings
3. Dimensional metrology of resist lines using a SEM model-based library approach
Villarrubia, J.S. ; Vladar, A.E. ; Bunday, B.D. ; Bishop, M.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVIII.  pp.199-209,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5375
4.

Conference Proceedings
Conference Proceedings
4. Determination of optimal parameters for CD-SEM measurement of line-edge roughness
Bunday, B.D. ; Bishop, M. ; McCormack, D.W., Jr. ; Villarrubia, J.S. ; Vladar, A.E. ; Dixson, R. ; Vorburger, T.V. ; Orji, N.G. ; Allgair, J.A.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVIII.  pp.515-533,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5375