1.

Conference Proceedings
Conference Proceedings
1. Improvement of critical dimension stability of chemically amplified resist by overcoat II
Kumada, T. ; Tange, K. ; Maetoko, K. ; Hosono, K. ; Tsuzuki, M. ; Yonetani, K. ; Terada, R. ; Nakashiba, Y. ; Anzai, S. ; Kikuchi, Y.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.101-106,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
2.

Conference Proceedings
Conference Proceedings
2. Sulfate-free photomask cleaning technology [6283-08]
Anzai, S. ; Takagi, N. ; Kamiyama, T ; Kawaguchi, N. ; Ishijima, A. ; Watanabe, T. ; Morimoto, T. ; Kuwajima, T. ; Nakatsu, M. ; Hasegawa, S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XIII.  pp.62830B-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6283