1.

Conference Proceedings
Conference Proceedings
1. High-performance e-beam resist coupling excellent dry etch resistance and sub-100-nm resolution for advanced mask and device making
Huang,W.-S. ; Kwong,R.W. ; Moreau,W.M. ; Lang,R. ; Robinson,C.F. ; Medeiros,D.R. ; Petrillo,K.E. ; Aviram,A. ; Mahorowala,A.P. ; Angelopoulos,M. ; Magg,C. ; Lawliss,M. ; Faure,T.B.
Pub. info.: Emerging lithographic technologies V : 27 February-1 March, 2001, Santa Clara, [California], USA.  pp.268-277,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4343
2.

Conference Proceedings
Conference Proceedings
2. Tunable antireflective coatings with built-in hard mask properties facilitating thin-resist processing
Mahorowala,A.P. ; Babich,K. ; Petrillo,K.E. ; Simons,J.P. ; Angelopoulos,M. ; Patel,V. ; Grill,A. ; Halle,S. ; Conti,R. ; Wu,C.-H.J. ; Wise,R. ; Chen,L. ; Thomas,A.C. ; Lee,B. ; Mahorowala,A.P.
Pub. info.: Emerging lithographic technologies V : 27 February-1 March, 2001, Santa Clara, [California], USA.  pp.306-316,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4343
3.

Conference Proceedings
Conference Proceedings
3. Patterning of hyperbranched resist materials by e-beam
Trimble,A.R. ; Tully,D.C. ; Frehet,J.M.J. ; Medeiros,D.R. ; Angelopoulos,M.
Pub. info.: Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA.  Part2  pp.1198-1201,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3999
4.

Conference Proceedings
Conference Proceedings
4. 193-nm positive-tone bilayer resist based on norbornene-maleic anhydride copolymers
Sooriyakumaran,R. ; Fenzel-Alexander,D. ; Brock,P.J. ; Larson,C.E. ; DiPietro,R.A. ; Wallraff,G.M. ; Hofer,D.C. ; Dawson,D.J. ; Mahorowala,A.P. ; Angelopoulos,M.
Pub. info.: Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA.  Part2  pp.1171-1180,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3999
5.

Conference Proceedings
Conference Proceedings
5. Extension of 248-nm optical lithography: a thin film imaging approach
Lin,Q. ; Katnani,A.D. ; Brunner,T.A. ; DeWan,C. ; Fairchok,C. ; LaTulipe,D.C.,Jr. ; Simons,J.P. ; Petrillo,K.E. ; Babich,K. ; Seeger,D.E. ; Angelopoulos,M. ; Soonyakumaran,R. ; Wallraff,G.M. ; Hofer,D.C.
Pub. info.: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 1  pp.278-288,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3333
6.

Conference Proceedings
Conference Proceedings
6. Positive bilayer resists for 248-and 193-nm lithography
Sooriyakumaran,R. ; Wallraff,G.M. ; Larson,C.E. ; Fenzel-Alexander,D. ; DiPietro,R.A. ; Opitz,J. ; Hofer,D.C. ; LaTulipe,D.C.,Jr. ; Simons,J.P. ; Petrillo,K.E. ; Babich,K. ; Angelopoulos,M. ; Lin,Q. ; Katnani,A.D.
Pub. info.: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 1  pp.219-227,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3333
7.

Conference Proceedings
Conference Proceedings
7. Conducting electron-beam resists based on polyaniline
Hupcey,M.A.Z. ; Angelopoulos,M. ; Gelorme,J.D. ; Ober,C.K.
Pub. info.: Emerging lithographic technologies II : 23-25 February 1998, Santa Clara, California.  pp.369-374,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3331
8.

Conference Proceedings
Conference Proceedings
8. New family of non-chemically amplified resists
Aviram,A. ; Angelopoulos,M. ; Babich,E.D. ; Babich,I.V. ; Petrillo,K. ; Seeger,D.E.
Pub. info.: Emerging lithographic technologies II : 23-25 February 1998, Santa Clara, California.  pp.349-358,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3331
9.

Conference Proceedings
Conference Proceedings
9. Pellicles for x-ray lithography masks
Maldonado,J.R. ; Cordes,S.A. ; Leavey,J.A. ; Acosta,R.E. ; Doany,F. ; Angelopoulos,M. ; Waskiewicz,C.
Pub. info.: Emerging lithographic technologies II : 23-25 February 1998, Santa Clara, California.  pp.245-254,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3331
10.

Conference Proceedings
Conference Proceedings
10. Effects of underlayer on performance of bilayer resists for 248-nm lithography
Babich,K. ; Callegari,A. ; Petrillo,K.E. ; Simons,J.P. ; LaTulipe,D.C.,Jr. ; Angelopoulos,M. ; Lin,Q.
Pub. info.: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 1  pp.726-734,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3333
11.

Conference Proceedings
Conference Proceedings
11. Conducting polyaniline coatings for submicron lithography and SEM metrology
Graham,T.O. ; Angelopoulos,M. ; Furman,B. ; Chen,R.K.-J. ; Moreau,W.M.
Pub. info.: Emerging lithographic technologies : 10-11 March 1997, Santa Clara, California.  pp.105-113,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3048
12.

Conference Proceedings
Conference Proceedings
12. Patterning of highly conducting polyaniline films
Graham,T.O. ; Afzali,A. ; Angelopoulos,M. ; Gelorme,J.D. ; Shaw,J.M.
Pub. info.: Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA.  pp.334-343,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3997
13.

Conference Proceedings
Conference Proceedings
13. CA resist with high sensitivity and sub-100-nm resolution for advanced mask and device making
Kwong,R.W. ; Huang,W.-S. ; Hartley,J.G. ; Moreau,W.M. ; Robinson,C. ; Angelopoulos,M. ; Magg,C. ; Lawliss,M.
Pub. info.: Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA.  pp.352-360,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3997
14.

Conference Proceedings
Conference Proceedings
14. Materials and modeling for organic light-emitting diodes
Scott,J.C. ; Carter,S.A. ; Karg,S. ; Angelopoulos,M.
Pub. info.: Light-Emitting Diodes: Research, Manufacturing, and Applications.  pp.86-91,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3002
15.

Conference Proceedings
Conference Proceedings
15. Use of KRS-XE positive chemically amplified resist for optical mask manufacturing
Ashe,B. ; Deverich,C. ; Rabidoux,P.A. ; Peck,B. ; Petrillo,K.E. ; Angelopoulos,M. ; Huang,W.-S. ; Moreau,W.M. ; Medeiros,D.R.
Pub. info.: 21st Annual BACUS Symposium on Photomask Technology.  4562  pp.664-672,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4562
16.

Conference Proceedings
Conference Proceedings
16. CA resist with high sensitivity and sub-100-nm resolution for advanced mask making
Huang,W.-S. ; Kwong,R.W. ; Hartley,J.G. ; Moreau,W.M. ; Angelopoulos,M. ; Magg,C. ; Lawliss,M.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VII.  pp.150-159,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4066
17.

Conference Proceedings
Conference Proceedings
17. Novel Si-based composite thin films for 193/157-nm attenuated phase-shift mask (APSM) applications
Chey,S.J. ; Guarnieri,C.R. ; Babich,K. ; Pope,K.R. ; Goldfarb,D. ; Angelopoulos,M. ; Racette,K.C. ; Hibbs,M.S. ; Gibson,M.L. ; Kimmel,K.R.
Pub. info.: Optical Microlithography XIV.  4346  pp.798-805,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346
18.

Conference Proceedings
Conference Proceedings
18. High-resolution patterning in chemically amplified resists: the effect of film thickness
Medeiros,D.R. ; Moreau,W.M. ; Petrillo,K.E. ; Chauhan,M. ; Huang,W.-S. ; Magg,C. ; Goldfarb,D. ; Angelopoulos,M. ; Nealey,P.F.
Pub. info.: Advances in Resist Technology and Processing XVIII.  4345  pp.241-250,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4345
19.

Conference Proceedings
Conference Proceedings
19. Characterization of thin and ultrathin polymer and resist films
Goldfarb,D.L. ; Lin,Q. ; Angelopoulos,M. ; Soles,C.L. ; Lin,E.K. ; Wu,W.-L.
Pub. info.: Advances in Resist Technology and Processing XVIII.  4345  pp.335-343,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4345
20.

Conference Proceedings
Conference Proceedings
20. Evaluation of an advanced chemically amplified resist for next-generation lithography mask fabrication
Magg,C. ; Lercel,M.J. ; Lawliss,M. ; Kwong,R.W. ; Huang,W.-S. ; Angelopoulos,M.
Pub. info.: 20th Annual BACUS Symposium on Photomask Technology.  pp.707-716,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4186
21.

Conference Proceedings
Conference Proceedings
21. When is bilayer thin-film imaging suitable: comparison with single-layer resists
Halle,S. ; Thomas,A.C. ; Armacost,M. ; Dalton,T.J. ; Chen,X.L. ; Bukofsky,S.J. ; Genz,O. ; Lu,Z.G. ; Butt,S.A. ; Chen,Z. ; Ferguson,R.A. ; Coker,E. ; Leidy,R.K. ; Lin,Q. ; Mahorowala,A.P. ; Babich,K. ; Petrillo,K.E. ; Angelopoulos,M. ; Ignatowicz,M. ; Bui,B.
Pub. info.: Optical Microlithography XIV.  4346  pp.970-981,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346
22.

Conference Proceedings
Conference Proceedings
22. Extending the performance of KRS-XE for high-throughput electron-beam lithography for advanced mask making
Medeiros,D.R. ; Petrillo,K.E. ; Bucchignano,J. ; Angelopoulos,M. ; Huang,W.-S. ; Li,W. ; Moreau,W.M. ; Lang,R. ; Kwong,R.W. ; Magg,C. ; Ashe,B.
Pub. info.: 21st Annual BACUS Symposium on Photomask Technology.  4562  pp.552-560,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4562
23.

Conference Proceedings
Conference Proceedings
23. High-performance e-beam resist coupling excellent dry etch resistance and sub-100-nm resolution for advanced mask making
Huang,W.-S. ; Kwong,R.W. ; Moreau,W.M. ; Lang,R. ; Robinson,C.F. ; Medeiros,D.R. ; Petrillo,K.E. ; Aviram,A. ; Mahorowala,A.P. ; Angelopoulos,M. ; Magg,C. ; Lawliss,M. ; Faure,T.B.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VIII.  pp.287-297,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4409
24.

Conference Proceedings
Conference Proceedings
24. Feature-shape and line-edge roughness measurement of deep submicron lithographic structures using small-angle neutron scattering
Lin,E.K. ; Wu,W. ; Lin,Q. ; Angelopoulos,M.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XV.  pp.414-422,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4344
25.

Conference Proceedings
Conference Proceedings
25. Image collapse issues in photoresist
Simons,J.P. ; Goldfarb,D.L. ; Angelopoulos,M. ; Messick,S. ; Moreau,W.M. ; Robinson,C. ; Pablo,J.J.de ; Nealey,P.F.
Pub. info.: Advances in Resist Technology and Processing XVIII.  4345  pp.19-29,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4345
26.

Conference Proceedings
Conference Proceedings
26. Line-edge roughness in positive-tone chemically amplified resists: effect of additives and processing conditions
Lin,Q. ; Goldfarb,D.L. ; Angelopoulos,M. ; Sriram,S.R. ; Moore,J.S.
Pub. info.: Advances in Resist Technology and Processing XVIII.  4345  pp.78-86,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4345
27.

Conference Proceedings
Conference Proceedings
27. High-contrast positive resists for e-beam mask making
Huang,W.-S. ; Kwong,R.W. ; Moreau,W.M. ; Angelopoulos,M. ; Bucchiagnano,J. ; Petrillo,K.E. ; Ito,H.
Pub. info.: 18th Annual BACUS Symposium on Photomask Technology and Management.  pp.400-408,  1998.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3546