1.

Conference Proceedings
Conference Proceedings
1. Extension of 248-nm optical lithography: a thin film imaging approach
Lin,Q. ; Katnani,A.D. ; Brunner,T.A. ; DeWan,C. ; Fairchok,C. ; LaTulipe,D.C.,Jr. ; Simons,J.P. ; Petrillo,K.E. ; Babich,K. ; Seeger,D.E. ; Angelopoulos,M. ; Soonyakumaran,R. ; Wallraff,G.M. ; Hofer,D.C.
Pub. info.: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 1  pp.278-288,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3333
2.

Conference Proceedings
Conference Proceedings
2. Positive bilayer resists for 248-and 193-nm lithography
Sooriyakumaran,R. ; Wallraff,G.M. ; Larson,C.E. ; Fenzel-Alexander,D. ; DiPietro,R.A. ; Opitz,J. ; Hofer,D.C. ; LaTulipe,D.C.,Jr. ; Simons,J.P. ; Petrillo,K.E. ; Babich,K. ; Angelopoulos,M. ; Lin,Q. ; Katnani,A.D.
Pub. info.: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 1  pp.219-227,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3333
3.

Conference Proceedings
Conference Proceedings
3. Effects of underlayer on performance of bilayer resists for 248-nm lithography
Babich,K. ; Callegari,A. ; Petrillo,K.E. ; Simons,J.P. ; LaTulipe,D.C.,Jr. ; Angelopoulos,M. ; Lin,Q.
Pub. info.: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 1  pp.726-734,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3333
4.

Conference Proceedings
Conference Proceedings
4. Characterization of thin and ultrathin polymer and resist films
Goldfarb,D.L. ; Lin,Q. ; Angelopoulos,M. ; Soles,C.L. ; Lin,E.K. ; Wu,W.-L.
Pub. info.: Advances in Resist Technology and Processing XVIII.  4345  pp.335-343,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4345
5.

Conference Proceedings
Conference Proceedings
5. When is bilayer thin-film imaging suitable: comparison with single-layer resists
Halle,S. ; Thomas,A.C. ; Armacost,M. ; Dalton,T.J. ; Chen,X.L. ; Bukofsky,S.J. ; Genz,O. ; Lu,Z.G. ; Butt,S.A. ; Chen,Z. ; Ferguson,R.A. ; Coker,E. ; Leidy,R.K. ; Lin,Q. ; Mahorowala,A.P. ; Babich,K. ; Petrillo,K.E. ; Angelopoulos,M. ; Ignatowicz,M. ; Bui,B.
Pub. info.: Optical Microlithography XIV.  4346  pp.970-981,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346
6.

Conference Proceedings
Conference Proceedings
6. Feature-shape and line-edge roughness measurement of deep submicron lithographic structures using small-angle neutron scattering
Lin,E.K. ; Wu,W. ; Lin,Q. ; Angelopoulos,M.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XV.  pp.414-422,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4344
7.

Conference Proceedings
Conference Proceedings
7. Line-edge roughness in positive-tone chemically amplified resists: effect of additives and processing conditions
Lin,Q. ; Goldfarb,D.L. ; Angelopoulos,M. ; Sriram,S.R. ; Moore,J.S.
Pub. info.: Advances in Resist Technology and Processing XVIII.  4345  pp.78-86,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4345