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12 results

Conference Proceedings

1. EUV emission of solid targets irradiated by femto- and picosecond laser pulses

Soumagne, G. ; Abe, T. ; Ikeda, K. ; Komori, H. ; Someya, H. ; Suganuma, T. ; Nakajima, K. ; Endo, A.

Pub. info.:	Fourth International Symposium on Laser Precision Microfabrication : 21-24 June, 2003, Munich, Germany. pp.274-277, 2003. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5063

Conference Proceedings

2. High-average-power EUV light source for the next-generation lithography by laser-produced Xe plasma

Nakano, M. ; Abe, T. ; Endo, A.

Pub. info.:	X-ray sources and optics : 2-3 August 2004, Denver, Colorado, USA. pp.1-10, 2004. Bellingham, Wash., USA. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5537

Conference Proceedings

3. Performance of liquid xenon jet laser-produced-plasma light source for EUV lithography

Suganuma, T. ; Abe, T. ; Komori, H. ; Takabayashi, Y. ; Endo, A.

Pub. info.:	Fifth International Symposium on Laser Precision Microfabrication : 11-14 May, 2004, Nara, Japan. pp.367-372, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5662

Conference Proceedings

4. Performance of kilowatt-class laser modules in scaling up laser produced plasma (LPP) EUV source

Komori, H. ; Imai, Y. ; Soumagne, G. ; Abe, T. ; Suganuma, T. ; Endo, A.

Pub. info.:	Emerging lithographic technologies IX : 1-3 March 2005, San Jose, California, USA. pp.272-278, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5751

Conference Proceedings

5. Step and repeat UV-nanoimprint lithography using a large area stamp

Soumagne, G. ; Abe, T. ; Suganuma, T. ; Imai, Y. ; Someya, H. ; Hoshino, H. ; Nakano, M. ; Komori, H. ; Takabayashi, Y. ; Ariga, T. ; Ueno, Y. ; Wada, Y. ; Endo, A. ; Toyoda, K.

Pub. info.:	Emerging lithographic technologies IX : 1-3 March 2005, San Jose, California, USA. pp.227-235, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5751

Conference Proceedings

6. Design of high-average-power clean EUV light source based on laser-produced Xenon plasma

Endo, A. ; Abe, T. ; Suganuma, T. ; Imai, Y. ; Someya, H. ; Hoshino, H. ; Masaki, N. ; Soumagne, G. ; Komori, H. ; Takabayashi, Y. ; Mizoguchi, H.

Pub. info.:	Laser-generated and other laboratory X-ray and EUV sources, optics, and applications : 4-6 August 2003, San Diego, California, USA. pp.256-262, 2004. Bellingham, Wash., USA. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5196

Conference Proceedings

7. Development of C02 laser produced Xe plasma EUV light source for microlithography [6151-27]

Mizoguchi, H. ; Endo, A. ; Arigo, T. ; Miura, T. ; Hoshino, H. ; Ueno, Y. ; Nakano, M. ; Komori, H. ; Sumitani, A. ; Abe, T. ; Suganuma, T. ; Soumagne, G. ; Someya, H. ; Takabayashi, Y. ; Toyoda, K.

Pub. info.:	Emerging Lithographic Technologies X. pp.61510S-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6151

Conference Proceedings

8. Development of liquid-jet laser-produced plasma light source for EUV lithography

Abe, T. ; Suganuma, T. ; Imai, Y. ; Sugimoto, Y. ; Someya, H. ; Hoshino, H. ; Soumagne, G. ; Komori, H. ; Mizoguchi, H. ; Endo, A. ; Toyoda, K.

Pub. info.:	Emerging Lithographic Technologies VII. 2 pp.776-783, 2003. Bellingham, WA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5037

Conference Proceedings

9. Measurements of energy distribution functions of xenon ions from laser-produced plasmas for lithography

Soumagne, G. ; Abe, T. ; Komori, H. ; Someya, H. ; Suganuma, T. ; Endo, A.

Pub. info.:	High-Power Laser Ablation V. pp.1090-1098, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5448

10.

Conference Proceedings

10. Performance of a 10-kHz laser-produced-plasma light source for EUV lithography

Abe, T. ; Suganuma, T. ; Imai, Y. ; Someya, H. ; Hoshino, H. ; Nakano, M. ; Soumagne, G. ; Komori, H. ; Takabayashi, Y. ; Mizoguchi, H. ; Endo, A. ; Toyoda, K. ; Horiike, Y.

Pub. info.:	Emerging Lithographic Technologies VIII. pp.160-167, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5374

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