1.

Conference Proceedings
Conference Proceedings
1. Development of a sub-100nm integrated imaging system using chromeless phase-shifting imaging with very high NA KrF exposure and off-axis illumination
Petersen, J.S. ; Conley, W. ; Roman, B.J. ; Litt, L.C. ; Lucas, K. ; Wu, W. ; Van Den Broeke, D.J. ; Chen, J.F. ; Laidig, T.L. ; Wampler, K.E. ; Gerold, D.J. ; Maslow, M.J. ; Socha, R.J. ; van Praagh, J. ; Droste, R.
Pub. info.: Design, process integration, and characterization for microelectronics : 6-7 March 2002, Santa Clara, USA.  pp.298-311,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4692
2.

Conference Proceedings
Conference Proceedings
2. Flare and its impact on low-k1 KrF and ArF lithography
La Fontaine, B. ; Dusa, M.V. ; Acheta, A. ; Chen, C. ; Bourov, A. ; Levinson, H.J. ; Litt, L.C. ; Mulder, M. ; Seltman, R. ; van Praagh, J.
Pub. info.: Optical Microlithography XV.  Part One  pp.44-56,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
3.

Conference Proceedings
Conference Proceedings
3. Development of a sub-100-nm integrated imaging system using chromeless phase-shifting imaging with very high NA KrF exposure and off-axis illumination
Petersen, J.S. ; Conley, W. ; Roman, B.J. ; Litt, L.C. ; Lucas, K. ; Wu, W. ; Van Den Broeke, D.J. ; Chen, J.F. ; Laidig, T.L. ; Wampler, K.E. ; Gerold, D.J. ; Socha, R.J. ; van Praagh, J. ; Droste, R.
Pub. info.: Optical Microlithography XV.  Part One  pp.515-529,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
4.

Conference Proceedings
Conference Proceedings
4. Extending KrF to 100-nm imaging with high-NA- and chromeless phase lithography technology
Socha, R.J. ; Van Den Broeke, D.J. ; Yu, L. ; Conley, W. ; Wu, W. ; Chen, J.F. ; Petersen, J.S. ; Gerold, D.J. ; van Praagh, J. ; Droste, R. ; Flagello, D.G. ; Hsu, S.D.
Pub. info.: Optical Microlithography XV.  Part One  pp.446-458,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
5.

Conference Proceedings
Conference Proceedings
5. Analysis of focus errors in lithography using phase-shift monitors
La Fontaine, B. ; Dusa, M.V. ; Krist, J. ; Acheta, A. ; Kye, J. ; Levinson, H.J. ; Luijten, C. ; Sager, C.B. ; Thomas, J. ; van Praagh, J.
Pub. info.: Optical Microlithography XV.  Part One  pp.315-324,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691