1.

Conference Proceedings
Conference Proceedings
1. Etch, reticle, and track CD fingerprint corrections with local dose compensation
van der Laan, H. ; Carpaij, R. ; Krist, J. ; Noordman, O. ; van Dommelen, Y. ; van Schoot, J. ; Blok, F. ; van Os, C. ; Stegeman, S. ; Hoogenboom, T. ; Hickman, C. ; Byers, E. ; Gugel, T.
Pub. info.: Data analysis and modeling for process control II : 3-4 March, 2005, San Jose, California, USA.  pp.107-118,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5755
2.

Conference Proceedings
Conference Proceedings
2. In-line lithography cluster monitoring and control using integrated scatterometry
Pollentier, I. ; Cheng, S.Y. ; Baudemprez, B. ; Laidler, D. ; van Dommelen, Y. ; Carpaij, R. ; Yu, J. ; Uchida, J. ; Viswanathan, A. ; Chin, D. ; Barry, K. ; Jakatdar, N.
Pub. info.: Data analysis and modeling for process control : 26-27 February 2004, Santa Clara, California, USA.  pp.105-115,  2004.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5378
3.

Conference Proceedings
Conference Proceedings
3. Performance of a high-productivity 300-mm dual-stage 193-nm 0.75-NA TWINSCAN AT:1100B system for 100-nm applications
Rubingh, R. ; van Dommelen, Y. ; Tempelaars, S. ; Boonman, M. ; Irwin, R. ; van Donkelaar, E. ; Burgers, H. ; Savenaije, G. ; Koek, B. ; Their, M. ; Roempp, O. ; Hembd-Soellner, C.
Pub. info.: Optical Microlithography XV.  Part One  pp.696-708,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
4.

Conference Proceedings
Conference Proceedings
4. Characterization of integrated optical CD for process control
Yu, J. ; Uchida, J. ; van Dommelen, Y. ; Carpaij, R. ; Cheng, S. ; Pollentier, I. ; Viswanathan, A. ; Lane, L. ; Barry, K.A. ; Jakatdar, N.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVIII.  pp.1059-1068,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5375
5.

Conference Proceedings
Conference Proceedings
5. Approaching new metrics for wafer flatness: an investigation of the lithographic consequences of wafer non-flatness
Valley, J.F. ; Poduje, N. ; Sinha, J. ; Judell, N. ; Wu, J. ; Boonman, M. ; Tempelaars, S. ; van Dommelen, Y. ; Kattouw, H. ; Hauschild, J. ; Hughes, W. ; Grabbe, A. ; Stanton, L.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVIII.  pp.1098-1108,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5375