1.

Conference Proceedings
Conference Proceedings
1. Laser Annealing for Ultra-Shallow Junction Formation in Advanced CMOS
Surdeanu, R. ; Ponomarev, Y.V. ; Cerutti, R. ; Pawlak, B.J. ; Nanver, L.K. ; Hoflijk, I. ; Stolk, P.A. ; Dachs, C.J.J. ; Verheijen, M.A. ; Kaiser, M. ; Hopstaken, M.J.P. ; van Berkum, J.G.M. ; Roozeboom, F. ; Lindsay, R.
Pub. info.: Rapid thermal and other short-time processing technologies III : proceedings of the international symposium.  pp.413-428,  2002.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2002-11
2.

Conference Proceedings
Conference Proceedings
2. Interdiffusion Mechanisms in Coherently Strained SiGe Multilayers
Cowern, N.E.B. ; Kersten, W.J. ; Kruif, R.C.M. ; van Berkum, J.G.M. ; de Boer, W.B. ; Gravesteijn, D.J. ; Bulle-Liewma, C.W.T.
Pub. info.: Proceedings of the Fourth International Symposium on Process Physics and Modeling in Semiconductor Technology.  pp.195-209,  1996.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 96-4
3.

Conference Proceedings
Conference Proceedings
3. 39 Characterization of Laminated CeO2-HfO2 High-k Gate Dielectrics Deposited by Pulsed Laser Deposition
Karakaya, K. ; Zinine, A. ; van Berkum, J.G.M. ; Croat, P. ; Verheijen, M.A. ; Rittersma, Z.M. ; Rijnders, G. ; Blank, D.H.A.
Pub. info.: Advanced gate stack, source/drain and channel engineering for Si-based CMOS, new materials, processes, and equipment : proceedings of the international symposium.  pp.331-338,  2005.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2005-05