1.

Conference Proceedings
Conference Proceedings
1. Characterization of ArF immersion process for production (Invited Paper)
Kohler, C. ; de Boeij, W. ; van Ingen-Schenau, K. ; van de Kerkhof, M. ; de Klerk, J. ; Kok, H. ; Swinkels, G. ; Finders, J. ; Mulkens, J. ; Fiolka, D. ; Heil, T.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.13-22,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754
2.

Conference Proceedings
Conference Proceedings
2. Mask substrate birefringence requirements for hyper-NA lithography [6154-159]
van de Kerkhof, M. ; de Boeij, W. ; Demarteau, M. ; Geh, B. ; Leunissen, L. H. A. ; Martin, P. ; Cangemi, M.
Pub. info.: Optical Microlithography XIX.  pp.615444-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6154
3.

Conference Proceedings
Conference Proceedings
3. The impact of mask birefringence on hyper-NA (NA>1.0) polarized imaging [5992-37]
Geh, B. ; Flagello, D. G. ; Pregler, C. ; Martin, P. M. ; Leunissen, L. H. A. ; Hansen, S. ; de Boeij, W.
Pub. info.: 25th Annual BACUS Symposium on Photomask Technology.  pp.599210-599210,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5992
4.

Conference Proceedings
Conference Proceedings
4. Full optical column characterization of DUV lithographic projection tools
van de Kerkhof, M.A. ; de Boeij, W. ; Kok, H. ; Silova, M. ; Baselmans, J. ; Hemerik, M.
Pub. info.: Optical Microlithography XVII.  pp.1960-1970,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377