1.

Conference Proceedings
Conference Proceedings
1. Using the aerial image measurement technique to speed up mask development for 193-nm immersion and polarization lithography
Zibold, A. M. ; Harnisch, W. ; Scherubl, T. ; Rosenkranz, N. ; Greif, J.
Pub. info.: Advanced microlithography technologies : 8-10 November, 2004, Beijing, China.  pp.223-232,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5645
2.

Conference Proceedings
Conference Proceedings
2. Application results at 193nm: lithography emulation by aerial imaging and supplementary high resolution measurements
Zibold, A. M. ; Schmid, R. ; Bohm, K. ; Brunner, R. ; Durr, A. C.
Pub. info.: EMLC 2005 : 21st European Mask and Lithography Conference : 31 January-3 February, 2005, Dresden, Germany.  pp.115-121,  2005.  Bellingham, Wash.,.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5835
3.

Conference Proceedings
Conference Proceedings
3. Aerial image measurement technique for today's and future 193-nm lithography mask requirements
Zibold, A. M. ; Scherubl, T. ; Menck, A. ; Brunner, R. ; Greif, J.
Pub. info.: 20th European Conference on Mask Technology for Integrated Circuits and Microcomponents.  pp.12-18,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5504
4.

Conference Proceedings
Conference Proceedings
4. Aerial image measuring system at 193 nm: a tool-to-tool comparison and global CD mapping
Zibold, A. M. ; Schmid, R. ; Bohm, K. ; Birkner, R.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.1083-1090,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567
5.

Conference Proceedings
Conference Proceedings
5. An advanced study for defect disposition through 193-nm aerial imaging [6152-102]
Durr, A. C. ; Zibold, A. M. ; Bohm, K.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XX.  pp.61522M-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6152
6.

Conference Proceedings
Conference Proceedings
6. Advanced mask metrology enabling characterization of imprint lithography templates
Zibold, A. M. ; Schmid, R. ; Seyfarth, A. ; Wachter, M. ; Harnisch, W. ; Doornmalen, H. v.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XIX.  pp.384-391,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5752
7.

Conference Proceedings
Conference Proceedings
7. Immersion mask inspection with hybrid-microscopic systems at 193 nm
Brunner, R. ; Menck, A. ; Steiner, R. ; Buchda, G. ; Weissenberg, S. ; Hom, U. ; Zibold, A. M.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.887-893,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567
8.

Conference Proceedings
Conference Proceedings
8. Advances with the new AIMS fab 193 2nd generation: a system for the 65 nm node including immersion [5853-131]
Zibold, A. M. ; Poortinga, E. ; Doornmalen, H. v. ; Schmid, R. ; Scherubl, T. ; Harnisch, W.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.371-379,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853
9.

Conference Proceedings
Conference Proceedings
9. Evaluation of printability of crystal growth defects in a 193-nm lithography environment using AIMS
Schmid, R. ; Zibold, A. M. ; Bhattacharyya, K. ; Chen, X. ; Grenon, B. J.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.1035-1043,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567