1.

Conference Proceedings
Conference Proceedings
1. Quantitative Optimization of the Dopant Concentration Range in BPSG Films for ULSI Circuit Technology
Vassilliev, V.Y. ; Zheng, J.Z. ; Lin, C.
Pub. info.: Proceedings of the Symposia on Electrochemical Processing in ULSI Fabrication I and Interconnect and Contact Metallization: materials, processes, and reliability.  pp.244-255,  1998.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 98-6
2.

Conference Proceedings
Conference Proceedings
2. Thickness Effect On Nickel Silicide Formation And Thermal Stability For Ultra Shallow Junction CMOS
Zhao, F.F. ; Shen, Z.X. ; Zheng, J.Z. ; Gao, W.Z. ; Osipowicz, T. ; Pang, C.H. ; Lee, P.S. ; See, A.K.
Pub. info.: Silicon materials - processing characterization and reliability : symposium held April 1-5, 2002, San Francisco, California, U.S.A..  pp.41-46,  2002.  Warrendale.  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 716
3.

Conference Proceedings
Conference Proceedings
3. Hydrogen Concentration Analysis in PECVD And RTCVD Silicon Nitride Thin Films and It's Impact on Device Performance
Wang, C.Y. ; Lim, E.H. ; Liu, H. ; Sudijono, J.L. ; Ang, T.C. ; Vassiliev, V.Y. ; Zheng, J.Z.
Pub. info.: Amorphous and heterogeneous silicon-based films - 2001 : symposium held April 16-20, 2001, San Francisco, California, U.S.A..  2001.  Warrendale.  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 664