1.

Conference Proceedings
Conference Proceedings
1. Transient Enhanced Diffusion for Implanted Doses Exceeding the Threshold Dose for Amorphization and for Implants into Preamorphized Substrates
Prussin, S. ; Liu, P. ; Zhang, P.F.
Pub. info.: Proceedings of the Fourth International Symposium on Process Physics and Modeling in Semiconductor Technology.  pp.135-141,  1996.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 96-4
2.

Conference Proceedings
Conference Proceedings
2. Role of Dose, Dose Rate, and Anneal Temperature on End-of-Range Dislocation Loops
Prussin, S. ; Pan, G.Z. ; Zhang, P.F.
Pub. info.: Proceedings of the Fourth International Symposium on Process Physics and Modeling in Semiconductor Technology.  pp.379-386,  1996.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 96-4