1.

Conference Proceedings
Conference Proceedings
1. Faster qualification of 193-nm resists for 100-nm development using photo cell monitoring
Jones, C.M. ; Kallingal, C. ; Zawadzki, M.T. ; Jeewakhan, N.N. ; Kaviani, N.N. ; Krishnan, P. ; Klaum, A.D. ; Ess, J.V.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVII.  2  pp.1231-1241,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5038
2.

Conference Proceedings
Conference Proceedings
2. A 65-nm node SRAM solution using alt-PSM with ArF lithography
Driessen, F.A. ; Zawadzki, M.T. ; Krishnan, P.R. ; Balasinski, A. ; Vandenberghe, G.
Pub. info.: Design and process integration for microelectronic manufacturing II [sic] : 26-27 February 2004, Santa Clara, California, USA.  pp.224-234,  2004.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5379