1.

Conference Proceedings
Conference Proceedings
1. Properties of Amorphous Nitrogenated Carbon (a-C:H:N) Films Deposited in Electron Cyclotron Resonance Plasma
Hong, J. ; Bhattacharyya, S. ; Zarrabian, M. ; Turban, G.
Pub. info.: Proceedings of the Fifth International Symposium on Diamond Materials.  pp.608-618,  1997.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 97-32
2.

Conference Proceedings
Conference Proceedings
2. Plasma Deposition of Diamond-Like Carbon and Carbon-Nitride Films in an Electron Cyclotron Resonance-Radio Frequency Discharge
Turban, G. ; Zarrabian, M. ; Hong, J.
Pub. info.: Plasma deposition and treatment of polymers : symposium held November 30-December 2, 1998, Boston, Massachusetts, U.S.A..  pp.89-,  1999.  Warrendale, Pa..  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 544
3.

Conference Proceedings
Conference Proceedings
3. Qualification of alternating PSM: defect inspection analysis in comparison to wafer printing results
Dettmann, W. ; Heumann, J.P. ; Hagner, T. ; Koehle, R. ; Rahn, S. ; Verbeek, M. ; Zarrabian, M. ; Weckesser, J. ; Hennig, M. ; Morgana, N.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.415-422,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
4.

Conference Proceedings
Conference Proceedings
4. AltPSM inspection capability and printability of quartz defects
Heumann, J.P. ; Zarrabian, M. ; Hennig, M. ; Dettmann, W. ; Zurbrick, L.S. ; Lang, M.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part Two  pp.1033-1040,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
5.

Conference Proceedings
Conference Proceedings
5. Alternating phase-shifting masks: phase determination and impact of quartz defects- theoretical and experimental results
Griesinger, U.A. ; Dettmann, W. ; Hennig, M. ; Heumann, J.P. ; Koehle, R. ; Ludwig, R. ; Verbeek, M. ; Zarrabian, M.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology IX.  pp.410-421,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4754