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Conference Proceedings

1. Sub-0.25-μm i-line photoresist: the role of advanced resin technology

Xu, C. ; Zampini, A. ; Sandford, H. F. ; Lachowski, J. ; Carmody, J.

Pub. info.:	Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California. pp.739-750, 1999. Bellingham, Wash., USA. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3678

Conference Proceedings

2. Exploratory approaches to the study of acid diffusion and acid loss from polymer films using absorption and fluorescence spectroscopy

Coenjarts, C. ; Cameron, J. F. ; Deschamps, N. ; Hambly, D. ; Pohlers, G. ; Scaiano, I. C. ; Sinta, R. F. ; Virdee, S. ; Zampini, A.

Pub. info.:	Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California. pp.1062-1073, 1999. Bellingham, Wash., USA. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3678

Conference Proceedings

3. Investigation of a fluorinated ESCAP-based resist for 157-nm lithography

Cho, S. ; Klauck-Jacobs, A. ; Yamada, S. ; Xu, C.B. ; Leonard, J. ; Zampini, A.

Pub. info.:	Advances in Resist Technology and Processing XIX. Part One pp.522-532, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4690

Conference Proceedings

4. Design and study of resist materials for 157-nm lithography

Yamada, S. ; Cho, S. ; Zampini, A.

Pub. info.:	Advances in Resist Technology and Processing XX. 1 pp.569-579, 2003. Bellingham, CA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5039