1.

Conference Proceedings
Conference Proceedings
1. Selection of attenuated phase shift mask compatible contact hole resists for KrF optical lithography
Lu, Z. G. ; Cui, Y. ; Thomas, A. C. ; Mansfield, S. M. ; Kunkel, G. ; Dobuzinsky, D. ; Zach, F. X. ; Liu, D. ; Chen, K. -J. R. ; Jordhamo, G. ; Cutmann, A. ; Farrell, T. R.
Pub. info.: Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California.  pp.923-934,  1999.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3678
2.

Conference Proceedings
Conference Proceedings
2. PHOTOLUMINESCENCE SPECTROSCOPY AND RBS CHANNELING EVALUATION OF VARIOUS CAPPING TECHNIQUES FOR RAPID THERMAL ANNEALING OF ION-IMPACTED ZnSe
Allen, E. L. ; Zach, F. X. ; Yu, K. M. ; Bourret, E. D.
Pub. info.: Compound semiconductor epitaxy : symposium held April 4-7, 1994, San Francisco, California, U.S.A..  pp.549-,  1994.  Pittsburgh, Pa..  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 340
3.

Conference Proceedings
Conference Proceedings
3. Inverting pupil illumination from resist- based measurements [6154-150]
Percin, G. ; Sezginer, A. ; Zach, F. X.
Pub. info.: Optical Microlithography XIX.  pp.61543W-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6154
4.

Conference Proceedings
Conference Proceedings
4. Building a computational model for process and proximity compensation [6154-141]
Percin, G. ; Huang, H.T. ; Zach, F. X. ; Sezginer, A. ; Mokhberi, A.
Pub. info.: Optical Microlithography XIX.  pp.61543N-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6154
5.

Conference Proceedings
Conference Proceedings
5. PPC model build methodology: sequential litho and etch verification [6349-72]
Mokhberi, A. ; Kamat, V. ; Sezginer, A: ; Zach, F. X. ; Percin, G. ; Carrero, J. ; Huang, H.-T.
Pub. info.: Photomask Technology 2006.  pp.63491Z-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6349