1.

Conference Proceedings
Conference Proceedings
1. Development of attenuating PSM shifter for F2 and high-transmission ArF lithography
Nozawa, O. ; Shiota, Y. ; Mitsui, H. ; Suzuki, T. ; Ohkubo, Y. ; Ushida, M. ; Yusa, S. ; Nishimura, T. ; Noguchi, K. ; Sasaki, S. ; Mohri, H. ; Hayashi, N.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.39-50,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
2.

Conference Proceedings
Conference Proceedings
2. CD-measurement technique for hole patterns on stencil mask
Ishikawa, M. ; Yusa, S. ; Takikawa, T. ; Fujita, H. ; Sano, H. ; Hoga, M. ; Hayashi, N.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.1107-1116,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567
3.

Conference Proceedings
Conference Proceedings
3. Image placement accuracy of single-membrane stencil masks for e-beam lithography [5992-162]
Kitada, M. ; Yusa, S. ; Kuwahara, N. ; Fujita, H. ; Takikawa, T. ; Sano, H. ; Hoga, M.
Pub. info.: 25th Annual BACUS Symposium on Photomask Technology.  pp.59924R-,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5992
4.

Conference Proceedings
Conference Proceedings
4. 200-mm EPL stencil mask fabrication and metrology
Fujita, H. ; Takigawa, T. ; Ishikawa, M. ; Aritsuka, Y. ; Yusa, S. ; Hoga, M. ; Sano, H.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.826-833,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256
5.

Conference Proceedings
Conference Proceedings
5. 200-mm EPL stencil mask fabrication and metrology at DNP: IP and CD accuracy within subfield
Takikawa, T. ; Ishikawa, M. ; Yusa, S. ; Kinase, Y. ; Fujita, H. ; Hoga, M. ; Hayashi, N. ; Sano, H.
Pub. info.: Emerging Lithographic Technologies VIII.  pp.727-739,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5374
6.

Conference Proceedings
Conference Proceedings
6. Evaluation of image placement of EPL stencil masks
Yusa, S. ; Ishikawa, M. ; Kinase, Y. ; Takikawa, T. ; Fujita, H. ; Sano, H. ; Houga, M. ; Hayashi, N.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.923-931,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446
7.

Conference Proceedings
Conference Proceedings
7. NIL template making and imprint evaluation [6349-85]
Yoshida, Y. ; Kobiki, A. ; Hiraka, T. ; Yusa, S. ; Sasaki, S. ; Itoh, K. ; Toyama, N. ; Kurihara, M. ; Mohri, H. ; Hayashi, N.
Pub. info.: Photomask Technology 2006.  pp.63492C-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6349
8.

Conference Proceedings
Conference Proceedings
8. Experimental analysis of image placement accuracy of single-membrane masks for LEEPL [5853-81]
Kitada, M. ; Aritsuka, Y. ; Yusa, S. ; Kuwahara, N. ; Fujita, H. ; Takikawa,T. ; Sano, H. ; Hoga, M.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.921-932,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853