1.

Conference Proceedings
Conference Proceedings
1. Accuracy of diffused aerial image model for full-chip-level optical proximity correction
Hong,J.-S. ; Kim,H.-B. ; Yune,H.-S. ; Ahn,C.-N. ; Koo,Y.-M. ; Baik,K.-H.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part2  pp.1024-1032,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
2.

Conference Proceedings
Conference Proceedings
2. Application of full-chip level optical proximity correction to memory device with sub-0.10-μm design rule and ArF lithography
Yune,H.-S. ; Kim,H.-B. ; Kim,W.-H. ; Ahn,C.-N. ; Ham,Y.-M. ; Shin,K.-S.
Pub. info.: Optical Microlithography XIV.  4346  pp.241-250,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346
3.

Conference Proceedings
Conference Proceedings
3. Potentialities of sub-100-nm optical lithography of alternating and phase-edge phase-shift mask for ArF lithography
Koo,S.-S. ; Kim,H.-B. ; Yune,H.-S. ; Hong,J.-S. ; Paek,S.-W. ; Eom,T.-S. ; Ahn,C.-N. ; Ham,Y.-M. ; Baik,K.-H. ; Lee,K.-Y. ; Kim,L.-J. ; Kim,H.-S.
Pub. info.: 20th Annual BACUS Symposium on Photomask Technology.  pp.346-358,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4186