1.

Conference Proceedings
Conference Proceedings
1. Optimizing Pad Groove Design and Polishing Kinematics for Reduced Shear Force, Low Force Fluctuation and Optimum Removal Rate Attributes of Copper CMP
Yasa Sampurno ; Ara Philipossian ; Sian Theng ; Takenao Nemoto ; Xun Gu ; Yun Zhuang ; Akinobu Teramoto ; Tadahiro Ohmi
Pub. info.: Science and technology of chemical mechanical planarization (CMP) : symposium held April 14-16, 2009, San Francisco, California, U.S.A..  pp.3-8,  2010.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 1157
2.

Conference Proceedings
Conference Proceedings
2. Pad Topography, Contact Area and Hydrodynamic Lubrication in Chemical-Mechanical Polishing
Leonard John Borucki ; Ting Sun ; Yun Zhuang ; David Slutz ; Ara Philipossian
Pub. info.: Science and technology of chemical mechanical planarization (CMP) : symposium held April 14-16, 2009, San Francisco, California, U.S.A..  pp.9-16,  2010.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 1157
3.

Conference Proceedings
Conference Proceedings
3. Novel End-point Detection Method by Monitoring Shear Force Oscillation Frequency for Barrier Metal Polishing in Advanced LSI
Xun Gu ; Takenao Nemoto ; Yasa Adi Sampurno ; Jiang Cheng ; Sian Nie Theng ; Ara Philipossian ; Yun Zhuang ; Akinobu Teramoto ; Takashi Ito ; Shigetoshi Sugawa ; Tadahiro Ohmi
Pub. info.: Science and technology of chemical mechanical planarization (CMP) : symposium held April 14-16, 2009, San Francisco, California, U.S.A..  pp.157-162,  2010.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 1157
4.

Conference Proceedings
Conference Proceedings
4. Screening Study on Frictional Force Analysis in Relation to Silica Abrasive and Slurry Properties
Yun Zhuang ; Yasa Adi Sampurno ; Fransisca Sudargho ; Geoff Steward ; Herbert Barthel ; Erwin-Peter Mayer ; Torsten Gottschalk-Gaudig ; Michael Stintz ; Uwe Kaetzel ; Andre Nogowski ; Michael Goldstein ; Ara Philipossian
Pub. info.: Advances and challenges in chemical mechanical planarization : symposium held April 10-12, 2007, San Francisco, California, U.S.A..  pp.233-238,  2007.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 991
5.

Conference Proceedings
Conference Proceedings
5. Experimental Investigation and Numerical Simulation of Pad Stain Formation During Copper CMP
Hyosang Lee ; Yun Zhuang ; Leonard Borucki ; Fergal O'Moore ; Sooyun Joh ; Ara Philipossian
Pub. info.: Advances and challenges in chemical mechanical planarization : symposium held April 10-12, 2007, San Francisco, California, U.S.A..  pp.165-170,  2007.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 991
6.

Conference Proceedings
Conference Proceedings
6. Investigation of Diamond Grit Size and Conditioning Force Effect on CMP Pads Topography
Ting Sun ; Leonard Borucki ; Yun Zhuang ; Ara Philipossian
Pub. info.: Advances and challenges in chemical mechanical planarization : symposium held April 10-12, 2007, San Francisco, California, U.S.A..  pp.45-52,  2007.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 991
7.

Conference Proceedings
Conference Proceedings
7. CMP Active Diamond Characterization and Conditioner Wear
Leonard Borucki ; Rumin Zhuang ; Yun Zhuang ; Ara Phulipossian ; Naoki Rikita
Pub. info.: Advances and challenges in chemical mechanical planarization : symposium held April 10-12, 2007, San Francisco, California, U.S.A..  pp.3-14,  2007.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 991