1.

Conference Proceedings
Conference Proceedings
1. Sub-100-nm DRAM cell patterning results and relation with lens aberration at 248-nm lithography era
You, T.-J. ; Kim, H.S. ; Kim, J.-S. ; Kim, S.-K. ; Kim, Y.-D. ; Youn, H.S. ; Kong, K.-K.
Pub. info.: Optical Microlithography XVI.  Part Three  pp.1327-1334,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
2.

Conference Proceedings
Conference Proceedings
2. CD metrology for avoiding shrinkage of ArF resist patterns in 100-nm ArF lithography
You, T.-J. ; Bok, C.-K. ; Shin, K.-S.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVI.  Part Two  pp.724-732,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4689