1.

Conference Proceedings
Conference Proceedings
1. Terahertz emission spectroscopy of coherent phonons in semiconductors
Tani,M. ; Fukasawa,R. ; Herrmann,M. ; Sakai,K. ; Nakashima,S. ; Yoshioka,N. ; Ishida,A. ; Fujiyasu,H.
Pub. info.: Ultrafast phenomena in semiconductors III : 27-29 January, 1999, San Jose, California.  pp.109-118,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3624
2.

Conference Proceedings
Conference Proceedings
2. Dry etching with consideration to thicker reticle size
Hoshino,E. ; Hasegawa,H. ; Shishido,K. ; Yoshioka,N. ; Aoyama,S. ; Hayashi,A. ; Sasaki,T. ; Iso,H. ; Tokoro,Y.
Pub. info.: Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan.  pp.206-211,  1997.  Bellingham, Washington.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3096
3.

Conference Proceedings
Conference Proceedings
3. Improvement of NLD mask dry etching system
Fujisawa,T. ; Yoshioka,N. ; Sasaki,T. ; Yamashiro,K.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VIII.  pp.390-395,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4409
4.

Conference Proceedings
Conference Proceedings
4. Development of a MoSi-based bilayer HT-PSM blank for ArF lithography
Kanai,S. ; Kawada,S. ; Isao,A. ; Sasaki,T. ; Maetoko,K. ; Yoshioka,N.
Pub. info.: 20th Annual BACUS Symposium on Photomask Technology.  pp.846-852,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4186
5.

Conference Proceedings
Conference Proceedings
5. High-performance photomask cleaning process using electrolyzed water
Nagamura,Y. ; Usui,H. ; Yoshioka,N. ; Morimoto,H.
Pub. info.: Photomask and X-Ray Mask Technology V.  pp.395-404,  1998.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3412
6.

Conference Proceedings
Conference Proceedings
6. Advanced FIB mask repair technology for ArF lithography: ？
Hagiwara,R. ; Yasaka,A. ; Takaoka,O. ; Kozakai,T. ; Yabe,S. ; Koyama,Y. ; Muramatsu,M. ; Doi,T. ; Suzuki,K. ; Okabe,M. ; Aita,K. ; Adachi,T. ; Kubo,S. ; Yoshioka,N. ; Morimoto,H. ; Morikawa,Y. ; Iwase,K. ; Hayashi,N.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VIII.  pp.555-562,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4409