1.

Conference Proceedings
Conference Proceedings
1. New die-to-database mask inspection system with i-line optics for 256-Mb and 1-Gb DRAMs
Tabata,M. ; Yamashita,K. ; Tsuchiya,H. ; Nomura,T. ; Inoue,H. ; Watanabe,T. ; Tojo,T. ; Yoshino,H.
Pub. info.: Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan.  pp.415-422,  1997.  Bellingham, Washington.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3096
2.

Conference Proceedings
Conference Proceedings
2. 193-nm chemically amplified positive resists based on poly(norbornene-alt-maleic anhydride)with plasticizing additives
Yoshino,H. ; Itani,T. ; Takimoto,M. ; Tanabe,H.
Pub. info.: Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA.  Part1  pp.112-119,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3999
3.

Conference Proceedings
Conference Proceedings
3. Deblocking reaction of chemically amplified ArF positive resists
Yamana,M. ; Itani,T. ; Yoshino,H. ; Hashimoto,S. ; Tanabe,H. ; Kasama,K.
Pub. info.: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 1  pp.32-42,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3333
4.

Conference Proceedings
Conference Proceedings
4. Compatibility of chemically amplified photoresists with bottom antireflective coatings
Yoshino,H. ; Itani,T. ; Hashimoto,S. ; Yamana,M. ; Yoshii,T. ; Tanabe,H.
Pub. info.: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 1  pp.655-665,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3333
5.

Conference Proceedings
Conference Proceedings
5. Deblocking reaction of chemically amplified positive DUV resists
Yamana,M. ; Itani,T. ; Yoshino,H. ; Hashimoto,S. ; Samoto,N. ; Kasama,K.
Pub. info.: Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California.  pp.269-279,  1997.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3049
6.

Conference Proceedings
Conference Proceedings
6. Acid evaporation property in chemically amplified resists
Hashimoto,S. ; Itani,T. ; Yoshino,H. ; Yamana,M. ; Samoto,N. ; Kasama,K.
Pub. info.: Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California.  pp.248-255,  1997.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3049
7.

Conference Proceedings
Conference Proceedings
7. Halation reduction for single-layer DUV resist processing
Yoshino,H. ; Itani,T. ; Hashimoto,S. ; Yamana,M. ; Samoto,N. ; Kasama,K.
Pub. info.: Advances in resist technology and processing XIII : 11-13 March 1996, San Clara, California.  pp.216-226,  1996.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2724