1.

Conference Proceedings
Conference Proceedings
1. Alignment performance versus mark quality
Kirk,J.P. ; Yoon,J.H. ; Wiltshire,T.J.
Pub. info.: Optical microlithography XI : 25-27 February 1998, Santa Clara, California.  pp.496-501,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3334
2.

Conference Proceedings
Conference Proceedings
2. 100-nm gate lithography for double-gate transistors
Krasnoperova,A.A. ; Zhang,Y. ; Babich,I.V. ; Treichler,J. ; Yoon,J.H. ; Guarini,K. ; Solomon,P.M.
Pub. info.: Optical Microlithography XIV.  4346  pp.925-935,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346