1.

Conference Proceedings
Conference Proceedings
1. Systematlc approach to correct critical patterns Induced by the lithography process at the full-chip level
Park,C.-H. ; Kim,Y.-H. ; Park,J.-S. ; Kim,K.-D. ; Yoo,M.-H. ; Kong,J.-T.
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part2  pp.622-629,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679
2.

Conference Proceedings
Conference Proceedings
2. Robust and fast OPC approach for metal interconnects of 0.13um logic devices
Park,J.-S. ; Kim,D.-H. ; Park,C.-H. ; Kim,Y.-H. ; Yoo,M.-H. ; Kong,J.-T. ; Kim,H.-W. ; Yoo,S.-I.
Pub. info.: 21st Annual BACUS Symposium on Photomask Technology.  4562  pp.1104-1111,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4562