1.

Conference Proceedings
Conference Proceedings
1. Characteristics of Miniatured VCO (Voltage Controlled Oscillator) for IMT-2K using MCM-C Technology
Yoo,C.S. ; Lee,Y.S. ; Lee,W.S. ; Kwak,S.B. ; Kang,N.K. ; Park,J.C.
Pub. info.: Proceedings : 2001 HD International Conference on High-Density Interconnect and Systems Packaging : April 17-20, 2001, Santa Clara Convention Center, Santa Clara, California.  pp.251-255,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4428
2.

Conference Proceedings
Conference Proceedings
2. Characterization of Buried Resistor for RF MCM-C Design
Cho,H.M. ; Yoo,C.S. ; Lim,W. ; Lee,W.S. ; Kwak,S.B. ; Kang,N.K. ; Park,J.C.
Pub. info.: 2000 International Conference on High-Density Interconnect and Systems Packaging, 25-28 April 2000, The Adam's Mark Hotel, Denver, Colorado, USA.  pp.192-195,  2000.  Reston, VA, Bellingham, Wash..  IMAPS — SPIE-The International Society for Optical
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4217
3.

Conference Proceedings
Conference Proceedings
3. Multibeam high-resolution UV wavelength reticle inspection
Hung,C.C. ; Yoo,C.S. ; Lin,C.H. ; Volk,W.W. ; Wiley,J.N. ; Khanna,S. ; Biellak,S. ; Wang,D.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VIII.  pp.520-531,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4409
4.

Conference Proceedings
Conference Proceedings
4. Multibeam high-resolution UV wavelength reticle inspection
Hung,C.C. ; Yoo,C.S. ; Lin,C.-H. ; Volk,W.W. ; Wiley,J.N. ; Khanna,S. ; Biellak,S. ; Wang,D.
Pub. info.: 20th Annual BACUS Symposium on Photomask Technology.  pp.165-172,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4186
5.

Conference Proceedings
Conference Proceedings
5. Foundry maskshop operation strategy and management
Yoo,C.S. ; Lin,J.C.H. ; Wang,J.J.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VII.  pp.440-445,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4066