1.

Conference Proceedings
Conference Proceedings
1. INTERFACE STRUCTURE AND DEFECTS IN CVD 3C-SiC ON (111) AND (112) TiC SUBSTRATES
Chien, Fen-Ren ; Nutt, S.R. ; Buchan, N. ; Carulli, Jr., J.M. ; Beetz, Jr., C.P. ; Yoo, W.S. ; Cummings, D.
Pub. info.: Evolution of surface and thin film microstructure : symposium held November 30-December 4, 1992, Boston, Massachusetts, U.S.A..  pp.733-738,  1993.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 280
2.

Conference Proceedings
Conference Proceedings
2. Annealing Characteristics of Copper Films for Power Device Applications
Yoo, W.S.
Pub. info.: Thin film materials, processes, and reliability, plasma processing for the 100 nm node and copper interconnects with low-k inter-level dielectric films : proceedings of the international symposium.  pp.330-337,  2003.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-13
3.

Conference Proceedings
Conference Proceedings
3. Significant Improvement in Device Performance of Advanced Dynamic Random Access Memory by Hot Wall-Based Single Wafer Rapid Thermal Annealing
Setokubo, T. ; Nakano, E. ; Aizawa, K. ; Miyoshi, H. ; Yamamoto, I. ; Fukada, T. ; Yoo, W.S.
Pub. info.: Advanced short-time thermal processing for Si-based CMOS devices : proceedings of the international symposium.  pp.135-144,  2004.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2004-01
4.

Conference Proceedings
Conference Proceedings
4. Wafer Temperature Characterization During Low-Temperature Annealing
Yoo, W.S. ; Fukada, T.
Pub. info.: Rapid thermal and other short-time processing technologies : proceedings of the international symposium.  pp.355-362,  2000.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2000-9
5.

Conference Proceedings
Conference Proceedings
5. Dry Oxidation and Implant Anneal in a Single Wafer Rapid Thermal Furnace
Fukada, T. ; Yoo, W.S. ; Hiraga, Y. ; Kang, K. ; Kitayama, H.
Pub. info.: Rapid thermal and other short-time processing technologies II : proceedings of the international symposium.  pp.113-120,  2001.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2001-9
6.

Conference Proceedings
Conference Proceedings
6. Spin-on-Glass Bake and Cure Using a Resistively Heated Batch Annealing Oven
Yoo, W.S. ; Fukada, T. ; Hiraga, Y. ; Kang, K. ; Yamamoto, J.
Pub. info.: Rapid thermal and other short-time processing technologies II : proceedings of the international symposium.  pp.401-408,  2001.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2001-9
7.

Conference Proceedings
Conference Proceedings
7. Ultra-Shallow Junction Implant Anneal Using Xenon Arc Flash Lamps
Yoo, W.S. ; Kang, K.
Pub. info.: Advanced short-time thermal processing for Si-based CMOS devices : proceedings of the international symposium.  pp.3-10,  2004.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2004-01
8.

Conference Proceedings
Conference Proceedings
8. 15 Ultra-shallow implant anneal using a short-wavelength flash light source
Yoo, W.S. ; Kang, K.
Pub. info.: Advanced short-time thermal processing for Si-based CMOS devices : proceedings of the international symposium.  pp.111-118,  2003.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-14
9.

Conference Proceedings
Conference Proceedings
9. 9 Ultra Shallow Junction Formation by Flash Annealing: The Challenges Aheac
Foggiato, J. ; Yoo, W.S.
Pub. info.: Advanced gate stack, source/drain and channel engineering for Si-based CMOS, new materials, processes, and equipment : proceedings of the international symposium.  pp.76-82,  2005.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2005-05
10.

Conference Proceedings
Conference Proceedings
10. Correlation between Hot Plate Emissivity and Wafer Temperature at Low Temperatures
Murakami, T. ; Fakada, T. ; Yoo, W.S.
Pub. info.: Rapid thermal and other short-time processing technologies III : proceedings of the international symposium.  pp.253-260,  2002.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2002-11