1.

Conference Proceedings
Conference Proceedings
1. Multi-layer resist system for 45-nm-node and beyond: Part II [6349-121]
Fujimura, Y. ; Morimoto, J. ; Manoshiro, A. ; Shimizu, M. ; Takamizawa, H. ; Hashimoto, M. ; Shiratori, H. ; Horii, K. ; Yokoya, Y. ; Ohkubo, Y. ; Enomoto, T. ; Sakaguchi, T. ; Nagai, M.
Pub. info.: Photomask Technology 2006.  pp.634936-634936,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6349
2.

Conference Proceedings
Conference Proceedings
2. Multi-layer resist system for 45-nm-node and beyond: part I [6349-18]
Hashimoto, M. ; Shiratori, H. ; Horii, K. ; Yokoya, Y. ; Ohkubo, Y. ; Takamizawa, H. ; Fujimura, Y. ; Morimoto, J. ; Manoshiro, A. ; Shimizu, M. ; Yokoyama, T. ; Enomoto, T. ; Nagai, M.
Pub. info.: Photomask Technology 2006.  pp.63490I-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6349
3.

Conference Proceedings
Conference Proceedings
3. NEGATIVE-CAR blanks feasibility study results for EB reticle fabrication beyond 100-nm node
Ota, F. ; Hashimoto, M. ; Asakawa, K. ; Higuchi, T. ; Yokoya, Y.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology IX.  pp.217-228,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4754
4.

Conference Proceedings
Conference Proceedings
4. Comparative evaluation results of CMS replacement resist for e-beam reticle fabrication
Kobayashi, H. ; Higuchi, T. ; Asakawa, K. ; Yokoya, Y. ; Wada, T.
Pub. info.: Photomask and X-Ray Mask Technology VI.  pp.69-78,  1999.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3748
5.

Conference Proceedings
Conference Proceedings
5. CAR blanks performance for advanced reticle fabrication
Hashimoto, M. ; Yokoya, Y. ; Higuchi, T. ; Ohta, F. ; Kawashima, S. ; Ohkubo, Y.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.144-156,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130