1.

Conference Proceedings
Conference Proceedings
1. Feasibility studies of ArF Lithography for sub-130-nm lithography
Lee,S.-H. ; Yim,D. ; Ham,Y.-M. ; Baik,K.-H. ; Choi,I.H.
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part1  pp.290-301,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679
2.

Conference Proceedings
Conference Proceedings
2. Intrafield critical dimension variation using KrF scanner system for 0.18-ｦﾌm lithography
Yim,D. ; Kim,H.-S. ; Baik,K.-H.
Pub. info.: Optical microlithography XI : 25-27 February 1998, Santa Clara, California.  pp.77-91,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3334
3.

Conference Proceedings
Conference Proceedings
3. Comparison study for sub-150-nm DUV lithography between high-NA KrF and ArF lithography
Yim,D. ; Kwon,K.-S. ; Ham,Y.-M. ; Baik,K.-H.
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part1  pp.138-149,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679
4.

Conference Proceedings
Conference Proceedings
4. Degree of patterning performance(DOPP)at low K lithography
Yim,D. ; Lee,S.-H. ; Gil,M.-G. ; Ham,Y.-M. ; Kim,B.-H. ; Baik,K.-H.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part2  pp.1250-1259,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
5.

Conference Proceedings
Conference Proceedings
5. Aberration effects in the region of 0.18-ｦﾌm lithography with KrF excimer stepper
Yim,D. ; Lim,C.-M. ; Kim,H.-S. ; Baik,K.-H.
Pub. info.: Optical Microlithography X.  pp.714-723,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3051
6.

Conference Proceedings
Conference Proceedings
6. Analysis of nonlinear overlay errors by aperture mixing related with pattern asymmetry
Lim,C.-M. ; Kwon,K.-S. ; Yim,D. ; Son,D.-H. ; Kim,H.-S. ; Baik,K.-H.
Pub. info.: Optical Microlithography X.  pp.106-115,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3051
7.

Conference Proceedings
Conference Proceedings
7. Optimum field-size strategy for DRAM mass production in low-k1 process
Park,C.-H. ; Yim,D. ; Lee,S.-H. ; Yang,H.-J. ; Choi,J.-H. ; Shin,Y.-C. ; Kim,C.-D. ; Choi,J.-S. ; Kang,K.-O. ; Kim,S.-W. ; Lee,D.-D. ; Yoon,G.-H.
Pub. info.: Optical Microlithography XIV.  4346  pp.1011-1019,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346