1.

Conference Proceedings
Conference Proceedings
1. A high-frame-rate DUV-optimized CCD for simultaneous measurements of illumination intensity, polarization amplitude, and polarization direction for very high NA imaging systems
Yim, D. ; Yang, H. ; Park, C. ; Hong, J. ; Choi, J.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.107-118,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754
2.

Conference Proceedings
Conference Proceedings
2. Considerations of model-based OPC verification for sub-70nm memory device [6156-39]
Kim, C.-K. ; Choi, J.-S ; Narn, B.-H ; Yim, D.
Pub. info.: Design and process integration for microelectronic manufacturing IV : 23-24 February, 2006, San Jose, California, USA.  pp.61561D-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6156
3.

Conference Proceedings
Conference Proceedings
3. High NA polarized light lithography for O.29kl process [6154-15]
Park, C. ; Lee, J. ; Yang, K. ; Tseng, S. ; Min, Y.-H ; Yang, H. ; Yim, D. ; Kim, J.
Pub. info.: Optical Microlithography XIX.  pp.61540F-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6154
4.

Conference Proceedings
Conference Proceedings
4. In-line-focus monitoring technique using lens aberration effect
Yang, H. ; Choi, J. ; Cho, B. ; Yim, D. ; Kim, J.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XIX.  pp.1-8,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5752
5.

Conference Proceedings
Conference Proceedings
5. Hybrid ORC method for low K1 process [5992-94]
Nam, B. ; Choi, J. ; Ahn, Y. ; Kim, C. ; Yune, H. ; Moon, J. ; Yim, D. ; Kim, J.
Pub. info.: 25th Annual BACUS Symposium on Photomask Technology.  pp.59922T-,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5992
6.

Conference Proceedings
Conference Proceedings
6. New OPC verification method using die-to-database inspection [6152-119]
Yang, H. ; Choi, J. ; Cho, B ; Hong, J. ; Song, J. ; Yim, D. ; Kim, J. ; Yamamoto. M.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XX.  pp.615232-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6152
7.

Conference Proceedings
Conference Proceedings
7. Characterizing optical proximity effect difference among exposure tools [6152-103]
Hong, J. ; Lee, J. ; Kang, E. ; Yang, H. ; Yim, D. ; Kim, J.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XX.  pp.61522N-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6152
8.

Conference Proceedings
Conference Proceedings
8. Aberration sensitivity control for the isolation layer in low-k1 DRAM process
Cho, B.-H. ; Yim, D. ; Park, C.-H. ; Lee, S.-H. ; Yang, H.-J. ; Choi, J.-H. ; Shin, Y.-C. ; Kim, C.-D. ; Choi, J.-S. ; Kang, K.-O. ; Kim, S.-W. ; Yu, T.-H. ; Hong, J. ; Kim, J.-C. ; Han, M.-S. ; Heo, H.-Y. ; Kim, Y.-D. ; Lee, D.-D. ; Yoon, G.-H. ; van schoot, J.B. ; Theeuwes, T. ; Min, Y.-H.
Pub. info.: Optical Microlithography XV.  Part Two  pp.831-839,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
9.

Conference Proceedings
Conference Proceedings
9. OPC accuracy and process window verification methodology for sub-100-nm node
Yang, H. ; Park, C. ; Hong, J. ; Jeong, G. ; Cho, B. ; Choi, J. ; Kang, C. ; Yang, K. ; Kang, E. ; Ji, S. ; Yim, D. ; Song, Y.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVIII.  pp.437-443,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5375
10.

Conference Proceedings
Conference Proceedings
10. Highly accurate modeling by using 2-dimensional calibration data set for model-based OPC verification [6283-104]
Kim, -K. C. ; Choi, -S. J. ; Nam, -H. B. ; Yim, D.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XIII.  pp.62830V-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6283