1.

Conference Proceedings
Conference Proceedings
1. Feasibility of improving CD-SEM-based APC system for exposure tool by spectroscopic-ellipsometry-based APC system
Lin, W. ; Liao, S. ; Tsai, R. ; Yeh, M. ; Hsieh, C. ; Yu, Y. ; Lin, B. S. ; Fu, S. ; Dziura, T. G.
Pub. info.: Data analysis and modeling for process control II : 3-4 March, 2005, San Jose, California, USA.  pp.138-144,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5755
2.

Conference Proceedings
Conference Proceedings
2. Capability of spectroscopic ellipsometry-based profile metrology for detecting the profile excursion of polysilicon gate
Yeh, M. ; Fang, S.-P. ; Tsau, B.-J. ; Huang, C.-C. ; Lin, B.S. ; Fu, S. ; Chen, J.C. ; Freed, R. ; Dziura, T.G. ; Slessor, M.D.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVIII.  pp.1135-1143,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5375