1.

Conference Proceedings
Conference Proceedings
1. Advanced photomask reconstruction with the Seiko SIR 3000
Ruatta,S.A. ; Smith,E.L. ; Yasaka,A.
Pub. info.: 17th Annual BACUS Symposium on Photomask Technology and Management.  pp.372-381,  1998.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3236
2.

Conference Proceedings
Conference Proceedings
2. Recent progress in repair accuracy of the focused ion-beam mask repair system
Aita,K. ; Yasaka,A. ; Kitamura,T. ; Matsumura,H. ; Satoh,Y. ; Nakamura,H. ; Fujikawa,J. ; Tsuchiya,K. ; Noguchi,S.
Pub. info.: Photomask and X-Ray Mask Technology III.  pp.324-335,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2793
3.

Conference Proceedings
Conference Proceedings
3. Performance of gas-assisted FIB repair for opaque defects
Satoh,Y. ; Nakamura,H. ; Fujikawa,J. ; Tsuchiya,K. ; Noguchi,S. ; Aita,K. ; Yasaka,A.
Pub. info.: 16th Annual BACUS Symposium on Photomask Technology and Management.  pp.124-137,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2884
4.

Conference Proceedings
Conference Proceedings
4. Advanced FIB mask repair technology in ArF lithography
Hiruta,K. ; Kubo,S. ; Morimoto,H. ; Yasaka,A. ; Hagiwara,R. ; Adachi,T. ; Morikawa,Y. ; Iwase,K. ; Hayashi,N.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VII.  pp.523-530,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4066
5.

Conference Proceedings
Conference Proceedings
5. Advanced FIB mask repair technology for ArF lithography: ？
Kubo,S. ; Hiruta,K. ; Morimoto,H. ; Yasaka,A. ; Hagiwara,R. ; Adachi,T. ; Morikawa,Y. ; Iwase,K. ; Hayashi,N.
Pub. info.: 20th Annual BACUS Symposium on Photomask Technology.  pp.158-164,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4186
6.

Conference Proceedings
Conference Proceedings
6. Advanced FIB mask repair technology for ArF lithography: ？
Hagiwara,R. ; Yasaka,A. ; Takaoka,O. ; Kozakai,T. ; Yabe,S. ; Koyama,Y. ; Muramatsu,M. ; Doi,T. ; Suzuki,K. ; Okabe,M. ; Aita,K. ; Adachi,T. ; Kubo,S. ; Yoshioka,N. ; Morimoto,H. ; Morikawa,Y. ; Iwase,K. ; Hayashi,N.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VIII.  pp.555-562,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4409