1.

Conference Proceedings
Conference Proceedings
1. Theoretical calculations of photoabsorption of polymers in the EUV (extreme ultraviolet) region
Matsuzawa,N.N. ; Irie,S. ; Yano,E. ; Okazaki,S. ; Ishitani,A.
Pub. info.: Emerging lithographic technologies V : 27 February-1 March, 2001, Santa Clara, [California], USA.  pp.278-284,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4343
2.

Conference Proceedings
Conference Proceedings
2. High-performance EB chemically amplified resists using alicyclic protective groups
Kon,J. ; Nozaki,K. ; Namiki,T. ; Yano,E.
Pub. info.: Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA.  Part2  pp.1207-1214,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3999
3.

Conference Proceedings
Conference Proceedings
3. Conductive bilevel resist system based on polysilphenylenesiloxane and polyaniline for nanometer lithography
Watanaben,K. ; Igarashi,M. ; Yano,E.
Pub. info.: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 1  pp.768-775,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3333
4.

Conference Proceedings
Conference Proceedings
4. Theoretical calculations of photoabsorption of molecules in the vacuum ultraviolet region
Matsuzawa,N.N. ; Mori,S. ; Yano,E. ; Okazaki,S. ; Ishitani,A. ; Dixon,D.A.
Pub. info.: Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA.  Part1  pp.375-384,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3999
5.

Conference Proceedings
Conference Proceedings
5. Lithographic performance and optimization of chemically amplified single-layer resists for EUV lithograph
Watanabe,T. ; Kinoshita,H. ; Miyafuji,A. ; Irie,S. ; Shirayone,S. ; Mori,S. ; Yano,E. ; Hada,H. ; Ohmori,K. ; Komano,H.
Pub. info.: Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA.  pp.600-607,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3997
6.

Conference Proceedings
Conference Proceedings
6. Methods to improve radiation sensitivity of chemically amplified resists by using chain reactions of acid generation
Nagahara,S. ; Sakurai,Y. ; Wakita,M. ; Yamamoto,Y. ; Tagawa,S. ; Komuro,M. ; Yano,E. ; Okazaki,S.
Pub. info.: Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA.  Part1  pp.386-394,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3999
7.

Conference Proceedings
Conference Proceedings
7. Control of line edge roughness of ultrathin resist films subjected to EUV exposure
Ryoo,M. ; Shirayone,S. ; Oizumi,H. ; Matsuzawa,N.N. ; Irie,S. ; Yano,E. ; Okazaki,S.
Pub. info.: Advances in Resist Technology and Processing XVIII.  4345  pp.903-911,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4345