1.

Conference Proceedings
Conference Proceedings
1. Surface Enhanced Raman Imaging of a Patterned Self-Assembled Monolayers
Yang, X.M. ; Tryk, D.A. ; Hashimoto, K. ; Fujishima, A.
Pub. info.: Proceedings of the Third International Symposium on Microstructures and Microfabricated Systems.  pp.159-165,  1997.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 97-5
2.

Conference Proceedings
Conference Proceedings
2. Electron-beam lithography method for sub-50-nm isolated trench with high aspect ratio
Yang, X.M. ; Eckert, A.R. ; Mountfield, K. ; Gentile, H. ; Seiler, C. ; Brankovic, S. ; Harris, R. ; Johns, E.
Pub. info.: Emerging Lithographic Technologies VII.  1  pp.168-177,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5037
3.

Conference Proceedings
Conference Proceedings
3. Electron-beam lithography of isolated trenches with chemically amplified positive resist
Eckert, A.R. ; Bojko, R.J. ; Gentile, H. ; Harris, R. ; Jayashankar, J. ; Johns, E. ; Minor, K. ; Mountfield, K. ; Seiler, C. ; Yang, X.M.
Pub. info.: Emerging Lithographic Technologies VI.  Part Two  pp.878-887,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4688
4.

Conference Proceedings
Conference Proceedings
4. E-beam proximity effect parameters for sub-100-nm features
Mountfield, K.R. ; Eckert, A.R. ; Yang, X.M. ; Johns, E.C.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.959-966,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
5.

Conference Proceedings
Conference Proceedings
5. Shrink assist film for enhanced resolution (SAFIER) process for printing of 20-nm trench with high aspect ratio
Yang, X.M. ; Gentile, H.
Pub. info.: Emerging Lithographic Technologies VIII.  pp.558-565,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5374