1.

Conference Proceedings
Conference Proceedings
1. Thin resist performance comparison for advanced e-beam reticle fabrication
Kobayashi,H. ; Higuchi,T. ; Asakawa,K. ; Yokoya,Y. ; Yamashiro,K.
Pub. info.: Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan.  pp.19-36,  1997.  Bellingham, Washington.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3096
2.

Conference Proceedings
Conference Proceedings
2. Evaluation of loading effect of NLD dry etching: ？
Fujisawa,T. ; Iwamatsu,T. ; Hiruta,K. ; Morimoto,H. ; Harashima,N. ; Sasaki,T. ; Hara,M. ; Yamashiro,K. ; Ohkubo,Y. ; Takehana,Y.
Pub. info.: 20th Annual BACUS Symposium on Photomask Technology.  pp.549-552,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4186
3.

Conference Proceedings
Conference Proceedings
3. Improvement of NLD mask dry etching system
Fujisawa,T. ; Yoshioka,N. ; Sasaki,T. ; Yamashiro,K.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VIII.  pp.390-395,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4409
4.

Conference Proceedings
Conference Proceedings
4. Process optimization for thin resists for advanced e-beam reticle fabrication
Kobayashi,H. ; Higuchi,T. ; Yamashiro,K. ; Askawa,K.
Pub. info.: 16th Annual BACUS Symposium on Photomask Technology and Management.  pp.67-82,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2884
5.

Conference Proceedings
Conference Proceedings
5. Spray developer for ZEP 7000
Kawata,A. ; Ozawa,K. ; Abe,N. ; Yamashiro,K. ; Aizawa,T.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VII.  pp.252-260,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4066
6.

Conference Proceedings
Conference Proceedings
6. Evaluation of loading effect of NLD dry etching
Iwamatsu,T. ; Fujisawa,T. ; Hiruta,K. ; Morimoto,H. ; Harashima,N. ; sasaki,T. ; Hara,M. ; Yamashiro,K. ; Ohkubo,Y. ; Takehana,Y.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VII.  pp.235-242,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4066
7.

Conference Proceedings
Conference Proceedings
7. Photomask blanks enhancement by optimizing resist baking and coating for advanced e-beam reticle fabrication
Higuchi,T. ; Kobayashi,H. ; Yamashiro,K. ; Asakawa,K. ; Yokoya,Y.
Pub. info.: Photomask and X-Ray Mask Technology III.  pp.78-95,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2793