1.

Conference Proceedings
Conference Proceedings
1. Hot spot management in ultra-low kl lithography [6156-24]
Hashimoto, K. ; Usui, S. ; Nojima, S. ; Tanaka, S. ; Yamanaka, E. ; Inoue, S.
Pub. info.: Design and process integration for microelectronic manufacturing IV : 23-24 February, 2006, San Jose, California, USA.  pp.61560N-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6156
2.

Conference Proceedings
Conference Proceedings
2. Mask pattern quality assurance based on lithography simulation with fine pixel SEM image [5992-59]
Kariya, M. ; Yamanaka, E. ; tanaka, S. ; Ikeda, T. ; Yamaguchi, S. ; Hashimoto, K. ; Itoh, M. ; Kobayashi, H. ; Kawashima, T. ; Narukawa, S.
Pub. info.: 25th Annual BACUS Symposium on Photomask Technology.  pp.59921M-,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5992
3.

Conference Proceedings
Conference Proceedings
3. Mask defect specifications with fail-bit-map analysis
Yamaguchi, S. ; Yamanaka, E. ; Morinaga, H. ; Hashimoto, K. ; Sakamoto, T. ; Hamaguchi, A. ; Matsumoto, S. ; Ikenaga, O. ; Inoue, S.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part Two  pp.826-835,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
4.

Conference Proceedings
Conference Proceedings
4. A photomask defect evaluation system
Yamanaka, E. ; Kanamitsu, S. ; Hirano, T. ; Tanaka, S. ; Ikeda, T. ; Ikenaga, O. ; Kawashima, T. ; Narukawa, S. ; Kobayashi, H.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.257-264,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446
5.

Conference Proceedings
Conference Proceedings
5. Fine pixel SEM image for mask pattern quality assurance based on lithography simulation [6283-48]
Yamanaka, E. ; Kariya, M. ; Yamaguchi, S. ; Tanaka, S. ; Hashimoto, K. ; Itoh, M. ; Kobayashi, H. ; Kawashima, T. ; Narukawa, S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XIII.  pp.62832E-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6283
6.

Conference Proceedings
Conference Proceedings
6. Reticle SEM specifications required for lithography simulation [5853-36]
Kariya, M. ; Yamanaka, E. ; Tanaka, S. ; Ikeda, T. ; Yamaguchi, S. ; Itoh, M. ; Kobayashi, H. ; Kawashima, T. ; Narukawa, S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.550-555,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853