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Conference Proceedings

1. Fabrication of Sputtered TiO2-xNx Photocatalyst Using Spark Plasma Sintered Targets

S.J. Kim ; Y.H. Oh ; S.B. Park ; W.I. Kwon ; R. Khudayberganov ; R. Khamidova ; D.S. Kim ; S.S. Park ; K.B. Park ; J.H. Ahn

Pub. info.:	THERMEC 2006 : supplement to THERMEC 2006, 5th International conference on processing and manufacturing of advanced materials, July 4-8, 2006, Vancouver, Canada. 539-543 pp.3562-3567, 2007. Stafa-Zuerich. Trans Tech Publications
Title of ser.:	Materials science forum
Ser. no.:	539-543(4)

Conference Proceedings

2. Baseline error-free non-TTL alignment system using oblique illumination for wafer steppers

D.H. Kim ; K.H. Lee ; Y.H. Oh ; J.H. Lee ; H.B. Chung

Pub. info.:	Optical/laser microlithography VIII : 22-24 February, 1995, Santa Clara, California. pp.928-937, 1995. Bellingham, WA. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2440

Conference Proceedings

3. Optical lithography technique with dummy diffraction mask for 0.20 µm T-shaped gate formation

B.-S. Park ; Y.H. Oh ; S.-S. Choi ; H.B. Chung ; H.J. Yoo

Pub. info.:	Optical/laser microlithography VIII : 22-24 February, 1995, Santa Clara, California. pp.850-859, 1995. Bellingham, WA. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2440